Gigaphoton Inc.

Komatsu Corporation

Ushio Denki

Ushio Inc.

Takahito Kumazaki

Osamu Wakabayashi

Tatsuya Ariga

Takeshi Ohta

Takashi Matsunaga

Hiroshi Furusato

Kotaro Sasano

Toru Suzuki

Junichi Fujimoto

Keisuke Ishida

Kouji Kakizaki

Takayuki Yabu

Shinji Nagai

Hiroaki Tsushima

Takashi Onose

Georg Soumagne

Satoshi Tanaka

Koji Kakizaki

Masanori Yashiro

Masashi Shinbori

Masaya Yoshino

Kazuya Takezawa

Natsuhiko Kouno

Noritoshi Itoh

Jun Akita

A line narrowing gas laser device includes an actuator changing a center wavelength of pulse laser light, and a processor controlling the actuator. The processor reads parameters including a number of irradiation pulses of pulse laser light to be radiated to one location of an irradiation receiving object, a shortest wavelength, and a longest wavelength; sets a first pattern with which the center wavelength is changed to approach the longest wavelength from the shortest wavelength and a second pattern with which the center wavelength is changed to approach the shortest wavelength from the longest wavelength such that at least one of the first pattern and the second pattern when the number of irradiation pulses is an even number is different from corresponding one when the number of irradiation pulses is an odd number; and controls the actuator so that the first pattern and the second pattern are alternately performed.

Line narrowing gas laser device, wavelength control method, and electronic device manufacturing method

A laser device includes a first actuator configured to adjust an oscillation wavelength of pulse laser light; a second actuator configured to adjust a spectral line width of the pulse laser light; and a processor configured to determine a target spectral line width by reading data specifying a number of irradiation pulses of the pulse laser light with which one location of an irradiation receiving object is irradiated and a difference between a shortest wavelength and a longest wavelength, control the second actuator based on the target spectral line width, and control the first actuator so that the oscillation wavelength periodically changes every number of the irradiation pulses between the shortest wavelength and the longest wavelength.

Laser device and electronic device manufacturing method

A line narrowing device includes first and second prisms disposed at positions different in a wavelength dispersion direction of any of the first and second prisms, a third prism disposed on the optical path of an optical beam and through which the beam width of the optical beam is enlarged and first and second parts of the optical beam are incident on the first and second prisms, respectively, a grating disposed across the optical path of the first part having passed through the first prism and the optical path of the second part having passed through the second prism, a first actuator configured to adjust the incident angle of the first part on the grating, a second actuator configured to adjust the incident angle of the second part on the grating, and a third actuator configured to adjust an energy ratio of the first and second parts.

Line narrowing device, electronic device manufacturing method

A narrowband laser apparatus may be provided with a laser resonator including optical elements for narrowing a spectral linewidth, a spectrometer configured to detect spectral intensity distributions of multiple pulses included in a pulsed laser beam output from the laser resonator, a spectral waveform producer configured to produce a spectral waveform by adding up the spectral intensity distributions of the multiple pulses, a device function storage configured to store a device function of the spectrometer, a wavelength frequency function generator configured to generate a wavelength frequency function which represents a frequency distribution of center wavelengths of the multiple pulses, and a deconvolution processor configured to perform deconvolution processing on the spectral waveform with the device function and the wavelength frequency function.

Narrowband laser apparatus and spectral linewidth measuring apparatus

The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply pulsed voltage to the pair of electrodes, a wavelength selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, and a controller. The controller is configured to measure a duty in a predetermined period before starting the second burst oscillation and a length of a suspension period from a time of ending the first burst oscillation to a time of starting the second burst oscillation, and perform a first control of the spectral width varying unit based on the duty and the length of the suspension period.

Line narrowed laser apparatus

The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.

There is provided a method of controlling the wavelength of a laser beam. The method includes measuring an absolute wavelength of the laser beam; calculating a difference between a reference wavelength and the absolute wavelength of the laser beam; and adjusting the reference wavelength of the laser beam based on the difference between the reference wavelength and the absolute wavelength of the laser beam, at an interval shorter than an interval for which the absolute wavelength of the laser beam is measured.

Method of controlling wavelength of laser beam and laser apparatus

A laser apparatus may comprise: a laser chamber configured to include a laser gain medium; a pair of electrodes disposed in the laser chamber; an energy detector configured to measure pulse energy of laser beams outputted by discharging between the pair of the electrodes; an optical element disposed on a light path of the laser beams; and a controller configured to calculate an integration value of absorption energy at the optical element, and determine whether the integration value exceeds a lifetime integration value of the optical element based on the pulse energy of the laser beams.

Laser apparatus and method of controlling laser apparatus

A master oscillator system may include a grating that functions as one of a plurality of resonator mirrors in an optical resonator, an optical element disposed within an optical path between the plurality of resonator mirrors, and an attitude control mechanism that adjusts an angle at which laser light traveling within the optical resonator is incident on the grating by adjusting the attitude of the optical element.

Master oscillator system and laser apparatus

An excimer laser may include a frame, a base plate on which the frame is disposed, an excimer laser configured to oscillate and output laser light by discharge-pumping within a chamber containing a laser gas, an optical element that is mounted upon the frame and that is disposed in the optical path of the outputted laser light and a heat removal mechanism connected to both the frame and the base plate.

Excimer laser and laser device

An optical device includes a plate-like optical element made of a calcium fluoride crystal, a holding member to sandwich and hold the optical element, a seal member provided between the holding member and one surface of the optical element in close contact therewith, and a cushioning member provided between the holding member and the other surface of the optical element in contact therewith. The cushioning member is made of one of a 304 stainless steel, a 303 stainless steel, a 316 stainless steel, a Hastelloy&#x2122; alloy, a carbon steel for machine construction S45C, and Inconel&#x2122;.

Optical device, and laser chamber and gas laser apparatus using the same

A laser apparatus may include an optical resonator, a laser chamber, an optical loss adjustment mechanism, and a spectral line width adjustment mechanism. The optical resonator includes a mirror configured to reflect a part of light and a grating. The laser chamber is provided in the optical resonator and contains a laser gain medium, configured to emit a laser beam. The optical loss adjustment mechanism is provided in the optical resonator and configured to adjust an optical loss of the laser beam. The spectral line width adjustment mechanism is provided in the optical resonator and configured to adjust a spectral line width of the laser beam.

Laser apparatus

The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser () and an amplification-stage laser (). Oscillation laser light having divergence is used as the oscillation-stage laser (), and the amplification-stage laser () comprises a Fabry-Perot etalon resonator made up of an input side mirror () and an output side mirror (). The resonator is configured as a stable resonator.

Two-stage laser system for aligners

An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.

Method for adjusting spectral line width of narrow-band laser

This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path.

Growing community of inventors

Oyama, Japan

Takahito Kumazaki