Canon Kabushiki Kaisha

Takahito Chibana

Genichiro Kudo

Kenichi Kobayashi

Hitoshi Nakano

Kiyoshi Arakawa

Junzo Kobayashi

In order to provide a polygon mirror which can reduce a light amount difference among respective image heights on a scanned surface with suppressing an increase in size in a light scanning apparatus, the polygon mirror according to the present invention includes a plurality of rectangular reflecting surfaces in which the following condition is satisfied:0.02<|1−|<0.10 where A represents a reflectivity at a center of the reflecting surface with respect to a light flux which is incident at a predetermined incident angle, and B represents the reflectivity at a predetermined point between the center and an end in the longitudinal direction of the reflecting surface with respect to the light flux which is incident at the predetermined incident angle.

Polygon mirror

A polygon mirror includes: a base body having a plurality of side surfaces, a first surface adjacent to the plurality of side surfaces, and a second surface adjacent to the plurality of side surfaces and opposite to the first surface; and a film formed on the plurality of side surfaces and extending from the plurality of side surfaces over the first surface and the second surface, wherein the film includes: a first region formed on the first surface along the plurality of side surfaces; a second region formed on the second surface along the plurality of side surfaces, and wherein a first volume of the first region and a second volume of the second region are different from each other.

Polygon mirror, deflection device, optical scanning apparatus and image forming apparatus

The present invention provides an exposure apparatus which includes a projection optical system that projects a pattern of a reticle onto a substrate, and exposes the substrate through the projection optical system and a liquid, the apparatus including a recovery unit which includes a recovery path connected to a recovery port, and is configured to reduce a pressure in the recovery path to recover the liquid, supplied to a space between the projection optical system and the substrate, through the recovery port and the recovery path, and a heating unit which is disposed in the recovery path, and configured to heat the liquid recovered through the recovery port and the recovery path.

Exposure apparatus and device fabrication method

An exposure apparatus for measuring a position of a stage, configured to hold a substrate, using a laser interferometer, and exposing the substrate through an original, and an optical element opposite to the substrate with a gap between the optical element and the substrate filled with liquid. A first supply nozzle is arranged around the optical element, which supplies the liquid to the gap, a first recovery nozzle arranged around the first supply nozzle recovers the liquid from the gap, a second supply nozzle supplies a gas outside the first recovery nozzle, a controller controls an amount of the liquid supplied from the first supply nozzle and an amount of the liquid and gas recovered from the first recovery nozzle, and a wall portion is arranged around the optical element and substantially parallel to a surface of the substrate. If Qis the amount of the liquid supplied from the first supply nozzle and Qis a sum of the amount of the liquid and gas recovered from the first recovery nozzle, a relationship Q&#x3c;Qis satisfied.

Exposure apparatus

An exposure apparatus includes a projection optical system for projecting a pattern of an original onto a substrate, a stage for holding the substrate, a cover for substantially surrounding an exposure light path, from an end portion of the projection optical system, at a side facing the stage, to the stage, a first supply port provided inside the cover, for supplying a purge gas into a space surrounded by the cover, and a first exhaust port provided in an end portion of the cover at a side facing the stage, for exhausting the gas.

Exposure apparatus and device manufacturing method

Disclosed is an exposure apparatus including a projection optical system for projecting a pattern of an original onto a substrate, a stage for holding the substrate, a cover for substantially surrounding an exposure light path, from an end portion of the projection optical system, at a side facing the stage, to the stage, a first supply port provided inside the cover, for supplying a purge gas into a space surrounded by the cover, and a first exhaust port provided in an end portion of said cover at a side facing the stage, for exhausting the gas.

An exposure apparatus for exposing a substrate to light via a mask. The apparatus includes a projection optical system configured to project a pattern of the mask onto the substrate, a cover configured to surround a path of light from the projection optical system toward the substrate, a first supply port arranged inside the cover and configured to supply inert gas inside the cover, a first recovery port arranged inside the cover and configured to recover gas inside the cover, a second supply port arranged outside the cover and configured to supply gas outside the cover, and a second recovery port arranged outside the cover and configured to recover gas outside the cover. The first direction from the first supply port to the first recovery port and a second direction from the second supply port to the second recovery port oppose each other at an angle not greater than 90&#xb0;.

Growing community of inventors

Utsunomiya, Japan

Takahito Chibana