Kaneka Corporation

Takahisa Fujimoto

Kenji Yamamoto

Hitoshi Tamai

Yuji Takahashi

Junichi Nakamura

Takashi Kuchiyama

Hiroaki Ueda

Hironori Hayakawa

Shimpei Okamoto

Shinya Omoto

Kozo Kondo

Tooru Irie

Takayoshi Kushizaki

A transparent electrode film includes a transparent electrode disposed on a transparent film base, wherein the transparent electrode contains a transparent conductive layer and a conductive metal pattern layer. The conductive metal pattern layer is patterned in the in-plane direction of the transparent film base. The transparent conductive layer and a protecting layer are disposed in a region where the conductive metal pattern layer is provided, and the conductive metal pattern layer is disposed closer to the transparent film base than the transparent conductive layer and the protecting layer. The protecting layer includes at least one selected from the group consisting of a precious metal and a metal oxide. The transparent electroconductive layer is also disposed at opening sections where the electroconductive metal pattern layer is absent.

Transparent electrode film, dimming element, and method for manufacturing transparent electrode film

The present invention provides a substrate with conductive layers, capable of improving both glare preventing properties and etching characteristics; a method for fabricating the same; and a substrate with touch-panel transparent electrodes. A substrate with conductive layers has, on at least one side of a transparent film substrate, a thin film underlayer, a metal oxide layer, and a first metal layer formed in this order. The thin film underlayer comprises nickel and copper or nickel oxide and copper oxide, the metal oxide layer comprises nickel oxide and copper oxide, and the first metal layer comprises of at least one of gold, silver, and copper. The substrate preferably satisfies the following relational expressions: [1] the thickness of the thin film underlayer is 20 nm or less; [2] the thickness of the metal oxide layer is 80 nm or less; and [3] the thickness of the thin film underlayer is equal to or less than the thickness of the metal oxide layer.

Substrate with conductive layers, substrate with touch-panel transparent electrodes, and method for fabricating same

Provided is a transparent conductive film including a transparent electrode layer composed of a patterned thin metal wire on at least one surface of a transparent film substrate. The line width of the wire is 5 &#x3bc;m or less. The wire includes a first metal layer and a second metal layer that is in contact with the first metal layer, in this order from a transparent film substrate side. Both of the first and second metal layers contain copper in an amount of 90% by weight or more. The total film thickness of the first and second metal layers is 150 to 1000 nm. The diffraction angle 2&#x3b8; of the (111) plane of the second metal layer is less than 43.400&#xb0; as measured using a CuK&#x3b1; ray as an X-ray source, and the first metal layer has crystal properties different from those of the second metal layer.

Conductive film substrate, transparent conductive film, and method for producing transparent conductive film

The substrate with a transparent electrode includes a first dielectric material layer mainly composed of SiO, a second dielectric material layer mainly composed of a metal oxide, a third dielectric material layer mainly composed of SiO, and a transparent electrode layer, in this order on a transparent film substrate. The transparent electrode layer is patterned to have an electrode layer-formed part and an electrode layer non-formed part. The transparent electrode layer is a layer mainly composed of an indium-tin composite oxide and having a thickness of 20 nm to 35 nm. The refractive index nof the first dielectric material layer, the refractive index nof the second dielectric material layer, and the refractive index nof the third dielectric material layer satisfy n&#x3c;n&#x3c;n. The first dielectric material layer, the second dielectric material layer and the third dielectric material layer each have specific thicknesses.

Substrate with transparent electrode, method for manufacturing thereof, and touch panel

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Osaka, Japan

Takahisa Fujimoto