Sumitomo Chemical Company, Limited

Takahiro Yasue

Koji Ichikawa

Tatsuro Masuyama

Satoshi Yamaguchi

Yukako Anryu

Hiromu Sakamoto

Yuichi Mukai

Akira Kamabuchi

Mitsuhiro Hata

Disclosed is a salt represented by formula (I): wherein, in formula (I),

Salt, acid generator, resist composition and method for producing resist pattern

A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein Rand R, m and n, Rand R, X, Rand Z1are defined in the specification.

Resist composition and method for producing resist pattern

A resist composition has a resin which includes a structural unit having an acid-labile group, an acid generator, and a non-ionic compound having a group represented by the formula (a) and having no unsaturated bond: 

Photoresist composition, compound and process of producing photoresist pattern

Salt and photoresist composition comprising the same

A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), 

A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), 

A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), 

The present invention provides a photoresist composition comprising wherein Rand Rare independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.

Photoresist composition

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator,  wherein R, A, A, A, X, R, R, m' and n&#x2032; are defined in the specification.

A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), 

A resist composition of the present invention has (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator and (D) a compound represented by the formula (II).  wherein Rrepresents a hydrogen atom or a methyl group; Arepresents a Cto Calkanediyl group; Rrepresents a Cto Chydrocarbon group having a fluorine atom, Rand Rin each occurrence independently represent a Cto Chydrocarbon group, a Cto Calkoxyl group, a Cto Cacyl group, a Cto Cacyloxy group, a Cto Calkoxycarbonyl group, a nitro group or a halogen atom; m' and n&#x2032; independently represent an integer of 0 to 4.

The present invention provides a salt represented by the formula (I): wherein Qand Qindependently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lrepresents a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, Lrepresents a single bond or a C1-C6 alkanediyl group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more &#x2014;CH&#x2014; in the alicyclic hydrocarbon group can be replaced by &#x2014;O&#x2014;, &#x2014;CO&#x2014; or &#x2014;SO&#x2014;, and Zrepresents an organic counter ion.

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Osaka, Japan

Takahiro Yasue