Canon Kabushiki Kaisha

Takahiro Yajimaa

Akira Sakai

Masahiro Kanai

Yasushi Fujioka

Shotaro Okabe

Tadashi Sawayama

Yuzo Koda

A film-forming apparatus for forming a non-single crystalline silicon series semiconductor film on a substrate in a film-forming space provided in a vacuum chamber using a very high frequency power supplied through a high frequency power supply means comprising a bar-like shaped electrode, wherein said bar-like shaped electrode is arranged such that the longitudinal direction thereof intersects a direction for said substrate to be moved, and a length of said film-forming space relative to the direction for said substrate to be moved is in a range of from {fraction (1/16)} to &frac12; of a wavelength of said very high frequency power supplied in said film-forming space. A film-forming method for forming a non-single crystalline silicon series semiconductor film on a substrate using said film-forming apparatus.

Growing community of inventors

Souraku-gun, Japan

Takahiro Yajimaa