Konishiroku Photo Industry Co., Ltd.

Takahiro Uozumi

Masaru Kanbe

Masayoshi Mayama

Naoto Abe

Hideyasu Ohta

Jun Shirasaki

Toyoaki Masukawa

Mitsuto Fujiwhara

Koichi Nagayasu

Ryosuke Satoh

Tohru Kobayashi

A photographic material comprising a light sensitive photographic layer and a support having thereon in order a layer containing alumina sol including colloidal particles and an electrolyte and a layer containing a hydrophobic polymer.

Light-sensitive photographic materials with improved antistatic layers

A method of undercoating a polyester film of a light sensitive photographic material is disclosed in which one side of the film is pretreated such that the contact angle with water is below 58.degree.. Additionally, a layer of an aqueous dispersion containing no organic solvent is applied to said side of said film, said dispersion containing a copolymer containing up to 60% by weight of glycidyl methacrylate and 25-60% by weight of ethyl acrylate.

Method of undercoating treatment of polyester films for photographic

The present application is directed to a process for subbing a photographic hydrophobic film which involves subjecting at least one surface of the film to a hydrophylizing pretreatment step, coating the pretreated surface with an aqueous dispersion containing a polymer which has particular comonomers in a combined amount of more than 76%, then coating the coated surface with a liquid containing colloidal silica.

Process for subbing photographic hydrophobic films

This invention relates to a development inhibitor-releasing compound of the following general formula: ##SPC1## Wherein Z is an atomic grouping necessary to form a carbocyclic ring; Y is a group which, when the sulfur atom of the thioether linkage is released, forms together with said sulfur atom a compound having a development-inhibiting action; and X is a hydroxyl group or a substituted or non-substituted amino group.

Process for developing light-sensitive silver halide photographic

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Hino, Japan

Takahiro Uozumi