Ushio Denki Kabushiki Kaisha

Kyushu University

Takahiro Shirai

Yusuke Teramoto

Shigeyuki Yokoyama

Takahiro Inoue

Motomu Kanai

Kyohei Seki

Hiroto Sato

Hironobu Yabuta

Yoshinori Fukui

Shigeki Matsunaga

Takehito Uruno

Teruki Honma

Daisuke Takaya

Kazunori Bessho

Mutsuko Niino

A X-ray generating device includes a chamber, a rotating body in the chamber, a starting material storage vessel for storing a target starting material in liquid form, and a starting material supply mechanism for applying the target starting material onto a surface of the rotating body. The X-ray generating device also includes an energy beam inlet window disposed at an opening of the chamber and configured to transmit an energy beam, which will be directed onto the target starting material on the surface of the rotating body and introduce the energy beam from the exterior of the chamber to the interior of the chamber, and an X-ray outlet window disposed at the opening of the chamber and configured to transmit the X-rays, which are generated upon irradiating the target starting material with the energy beam, and allow the X-rays to proceed to the exterior of the chamber.

X-ray generator

The present invention provides a compound capable of being used as an active ingredient of an anti-cancer agent. To provide an anti-cancer agent with few side effects, an object of the present invention is to provide a compound capable of selectively inhibiting the target, i.e., DOCK1, or a salt thereof. The pyridinone compound of the present invention is represented by Formula (1):  

Pyridinone compound and use thereof

Each of two discharge electrodes is partially immersed in a container, and rotations of the electrode cause a high-temperature plasma material adhering to the electrode to be conveyed into a discharge space. EUV light is emitted by generating a pulse discharge between the electrodes in a state where the high-temperature plasma material is vaporized. A plurality of capturing grooves for capturing the high-temperature plasma material are provided in the form of a plurality of concentric circles near the outer periphery of each discharge electrode. When each discharge electrode rotates, the high-temperature plasma material, which adheres to an area unnecessary for plasma generation, flows into the capturing grooves. As a result, the film thickness of the high-temperature plasma material does not increase very much at the outer periphery of each electrode, and it is possible to suppress the scattering of the high-temperature plasma material into a chamber interior.

Discharge electrodes for use in a light source device

An extreme ultraviolet (EUV) light source device and foil trap, the device including a vessel; an EUV radiating species supply means that feeds an extreme ultraviolet radiating species into the vessel; a discharge part with discharge electrodes that heat and excite the EUV radiating species and generate a high-temperature plasma; a collector mirror collecting EUV radiation emitted from the plasma; the foil trap installed between the discharge part and the mirror; an extractor part extracting the collected radiation; and an evacuation means exhausting and regulating pressure within the vessel. The foil trap includes foils extending radially from a main axis thereof to capture debris from the light source, while allowing the emitted radiation to pass through a region thereof to the mirror. A length of at least part of the foils in directions parallel to the main axis is shorter in positions close to the main axis than distant therefrom.

Foil trap and extreme ultraviolet light source device using the foil trap

There is provided a connection device for connecting a first depressurization vessel to a second depressurization vessel. The connection device includes a communication hole comprising a first opening which is connected to the first depressurization vessel, and a second opening which is connected to the second depressurization vessel, the first opening and the second opening being, respectively, at opposite ends of the communication hole such that extreme ultraviolet radiation passes in a radiation direction from the first opening to the second opening; a gas inlet through which a gas flows into the communication hole in a direction perpendicular to the radiation direction of the extreme ultraviolet radiation; and a gas outlet which is opposed to the gas inlet such that the gas passes out the gas outlet.

Connection device

An extreme ultraviolet radiation source device comprises a vessel; an electric discharge section including a pair of main discharge electrodes; a material supply unit which supplies an extreme ultraviolet radiating species to the electric discharge section; a high voltage generating section which impress high voltage to the pair of main discharge electrodes; a grazing incidence type collector unit which condenses extreme ultraviolet light emitted from high temperature plasma; a light extraction section formed in the vessel; a gas supply unit which supplies gas into the vessel from a light emitting side of the collector unit, an exhaust unit which discharges the gas from a light incidence side of the collector unit; wherein a flow path through which the gas supplied from the light emitting side of the collector unit passes is formed only inside the collector unit.

Extreme ultraviolet radiation source device

Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes a raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment.

Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation

An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics. Between them, an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with a laser. Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.

Growing community of inventors

Gotenba, Japan

Takahiro Shirai