Jsw Aktina System Co., Ltd.

The Japan Steel Works, Ltd.

Takahiro Fuji

Yoshihiro Yamaguchi

Yuki Suzuki

Takahiro Mikami

Ryo Shimizu

Hiroaki Imamura

Yuichi Nakada

Takashi Nagai

Tomoya Oda

A laser processing apparatus according to an embodiment includes a laser light irradiation unit and a conveying stage capable of allowing a substrate to float and convey. The conveying stage includes: a laser light irradiation region; and a substrate conveying region separated from the laser light irradiation region, a surface of the laser light irradiation region facing the substrate is configured by a first member from which a first gas is capable of jetting out to float the substrate, a surface of the substrate conveying region facing the substrate is configured by a plurality of second members from which a second gas is capable of jetting out to float the substrate, and the plurality of second members in the substrate conveying region are disposed to be separated from each other.

Laser processing apparatus and method of manufacturing semiconductor device

A flotation conveyance apparatus according to an embodiment conveys a substrate while floating the substrate by ejecting a gas to a lower surface of the substrate. The flotation conveyance apparatus includes an upper plate disposed on the substrate side including a plurality of ejecting ports for ejecting the gas and a lower plate disposed under the upper plate. Flow-paths for supplying the gas to the plurality of ejecting ports are provided on at least one of the upper plate and the lower plate.

Flotation conveyance apparatus and laser processing apparatus

A laser irradiation apparatus includes a laser generation device, a levitation unit to levitate an object to which the laser light is applied, and a conveyance unit to convey the levitated object. The conveyance unit includes a holding mechanism for holding the object by absorption, and a moving mechanism for moving the holding mechanism in a conveyance direction. The holding mechanism includes a base including a plurality of through holes, a plurality of pipes respectively connected to the through holes, a vacuum generation device configured to evacuate air from the pipes, and a plurality of absorption assistance valves each disposed in the middle of a respective one of the pipes, each of the plurality of absorption assistance valves being configured to be closed when a flow rate of a gas flowing into the pipe through the through hole becomes equal to or higher than a threshold.

Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device

According to one embodiment, a laser lift-off apparatus () which irradiates with laser light () from a side of a substrate () an interface between the substrate () and a separating layer () of a workpiece () including the substrate () and the separating layer () formed over the substrate (), and separates the separating layer () from the substrate () includes: an injection unit () which blows a gas () onto the workpiece () and blows away dusts existing on a surface of the workpiece (), and a dust collecting unit () which includes an opening () at a position meeting an irradiation position of the laser light (), and sucks and collects the blown dusts through the opening ().

Laser lift-off apparatus, laser lift-off method, and method for manufacturing organic el display

A laser irradiation apparatus () according to one embodiment irradiates a workpiece () with a laser beam () while conveying the workpiece () caused to float with the use of a flotation unit (). The flotation unit () includes precision float regions () and rough float regions (to). The precision float regions () are configured to cause the workpiece () to float by utilizing ejection and suction of a gas, and the rough float regions are configured to cause the workpiece () to float by utilizing ejection of a gas without suction of a gas.

Laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device

A flotation conveyance apparatus according to an embodiment is for conveying a substrate while floating the substrate by ejecting a gas to a lower surface of the substrate. The flotation conveyance apparatus includes a plurality of ejecting ports configured to eject the gas to the substrate, a downstream flow-path configured to supply the gas to the plurality of ejecting ports, a upstream flow-path configured to supply the gas to the downstream flow-path, and a gas supply port configured to supply the gas to the downstream flow-path. A cross-sectional area of the upstream flow-path is configured to be larger than a cross-sectional area of the downstream flow-path.

A laser irradiation apparatus () according to one embodiment includes a laser generating device () that generates a laser beam, a flotation unit () that causes a workpiece () that is to be irradiated with the laser beam to float, and a conveying unit () that conveys the floating workpiece (). The conveying unit () conveys the workpiece () with the conveying unit () holding the workpiece () at a position where the conveying unit () does not overlap an irradiation position () of the laser beam. The laser irradiation apparatus () according to one embodiment makes it possible to suppress uneven irradiation with a laser beam.

A laser irradiation apparatus () according to an embodiment includes a laser generation device () configured to generate laser light, and a levitation unit () configured to levitate an object to be processed () to which the laser light is applied. The levitation unit () includes a first area and a second area, and the first and second areas are arranged so that, in a plane view, a focal point of the laser light overlaps the first area and the focal point of the laser light does not overlap the second area. A surface part of the second area is formed of a metal member.

A flotation conveyance apparatus according to an embodiment includes a flotation unit for floating a substrate by ejecting a gas to a lower surface of the substrate. The flotation unit includes a plurality of ejecting ports provided on a surface facing the substrate and configured to eject the gas, and slits penetrating the flotation unit in a vertical direction. The flotation conveyance apparatus is configured in such a way that the gas staying between a surface of the flotation unit facing the substrate and the substrate is discharged to a lower surface side of the flotation unit through the slits.

A laser irradiation apparatus includes a laser generation device, a levitation unit to levitate an object to which the laser light is applied, and a conveyance unit to convey the levitated object. The conveyance unit includes a holding mechanism for holding the object by absorption, and a moving mechanism for moving the holding mechanism in a conveyance direction. The holding mechanism includes a base including a plurality of through holes, a plurality of pipes respectively connected to the through holes, a vacuum generation device configured to evacuate air from the f pipes, and a plurality of absorption assistance valves each disposed in the middle of a respective one of the pipes, each of the plurality of absorption assistance valves being configured to be closed when a flow rate of a gas flowing into the pipe through the through hole becomes equal to or higher than a threshold.

The invention is an atmosphere formation apparatus that is provided in a floatation conveyance apparatus, the floatation conveyance apparatus conveying a workpiece while performing floating support of the workpiece by gas injection, the atmosphere formation apparatus including a small-range atmosphere formation device that forms a small-range atmosphere B in a large-range atmosphere A, the large-range atmosphere A being an atmosphere in a large-range region containing a conveyance path along which the conveyance is performed, the small-range atmosphere B being an atmosphere in a small-range region containing the conveyance path, the small-range atmosphere B being different from the large-range atmosphere A.

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Yokohama, Japan

Takahiro Fuji