Tokyo Ohka Kogyo Co., Ltd.

Riken Corporation

Hokkaido University

Tokyo Institute of Technology

Takahiro Dazai

Daiju Shiono

Tomoyuki Hirano

Tasuku Matsumiya

Hiroaki Shimizu

Yoshiyuki Utsumi

Takayoshi Mori

Ken Miyagi

Sanae Furuya

Tsuyoshi Nakamura

Takehiro Seshimo

Masatoshi Arai

Takaya Maehashi

Kotaro Endo

Tsuyoshi Kurosawa

Hideto Nito

Kyoko Ohshita

Akiya Kawaue

Takahiro Senzaki

Jun Iwashita

Junichi Tsuchiya

Shigenori Fujikawa

Sho Abe

Ryoichi Takasu

Kenri Konno

Komei Hirahara

Mari Koizumi

Toshifumi Satoh

Takuya Isono

Hideo Hada

Yoshitaka Komuro

Masaru Takeshita

Taku Hirayama

Fumitake Kaneko

Daichi Takaki

Daisuke Kawana

Kensuke Matsuzawa

Hitoshi Yamano

Teruaki Hayakawa

Takaaki Kaiho

Harumi Hayakawa

Shinichi Kohno

Lei Dong

Yoshiyuki Utsume

Kohei Kasai

Kyoko Oshita

Shunma Tanaka

A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) formed of a repeating structure of styrene units, the block (b1) being partially substituted with a constituent unit represented by the following General Formula (c1) and a block (b2) having a repeating structure of methyl methacrylate units. In the formula, R is a hydrogen atom or a methyl group and Ris a hydrophobic functional group

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

A resin composition for forming a phase-separated structure containing a block copolymer having a first block and a second block, in which the first block is formed of a constituent unit represented by Formula (b1), the second block is formed of a constituent unit represented by Formula (b2m) and a random copolymer having a constituent unit represented by Formula (b2g), and a ratio of a volume of the first block is 20% to 80% by volume. In the formulas, Ris a hydrogen atom or an alkyl group, Ris a hydrogen atom or a methyl group, Ris an alkyl group which may have a silicon atom, a fluorine atom, a carboxy group, an amino group, a hydroxy group, or a phosphoric acid group, Ris a linear or branched alkylene group having 1 to 10 carbon atoms, which may have a hydroxy group, and Ris a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms 

A composition for forming a phase-separated structure contains a block copolymer having a block (b1) consisting of a repeating structure of a styrene unit and a block (b2) consisting of a repeating structure of a methyl methacrylate unit, in which the block (b2) is disposed at least at one terminal portion of the block copolymer, the block copolymer has a structure (e1) represented by General Formula (e1) at least at one main chain terminal, and the structure (e1) is bonded to the main chain terminal of the block (b2) disposed at a terminal portion of the block copolymer. Rerepresents a hydrocarbon group containing a hetero atom, and Re1 represents a hydrogen atom or a halogen atom. 

A method of producing a structure containing a phase-separated structure, including: a step of using a resin composition for forming a phase-separated structure including a block copolymer and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety to form a BCP layer () containing a block copolymer on a substrate (); and a step of vaporizing at least a part of the compound (IL), and phase-separating the BCP layer () to obtain a structure (') containing a phase-separated structure.

Method of producing structure containing phase-separated structure

A method of forming a resist pattern using a resist composition containing a base component (A) which exhibits reduced solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, the base component (A) including a resin component (A1) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below and a structural unit (a2) containing a lactone-containing cyclic group or the like (in formula (a0-1), Rarepresents a monovalent substituent having a polymerizable group, Larepresents O, S or a methylene group, Rrepresents a linear or branched hydrocarbon group of 2 to 20 carbon atoms which may have a substituent, or a cyclic hydrocarbon group which may have a hetero atom, and n represents an integer of 0 to 5). 

Method of forming resist pattern

A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.

Method of producing structure containing phase-separated structure and method of forming top coat film

There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0) shown below. In the formula, A&#x2033; represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; Rrepresents a lactone-containing cyclic group, an &#x2014;SO&#x2014; containing cyclic group or a carbonate-containing cyclic group; and Wrepresents a group which is formed by polymerization reaction of a group containing a polymerizable group. 

Resist composition, method of forming resist pattern, polymeric compound and compound

An undercoat agent used for phase separating a layer containing a block copolymer having a block of a structural unit derived from an (&#x3b1;-substituted) acrylate ester on a substrate, and which contains a resin component including a structural unit represented by formula (ba0-1), and/or a structural unit represented by formula (ba0-2), and a structural unit (ba0-3) having a substrate interacting group, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, Rand Rrepresent a halogen atom or an organic group of 1 to 20 carbon atoms which may contain an oxygen atom, a halogen atom, or a silicon atom, and n is 1 to 5.

Undercoat agent and method of producing structure containing phase-separated structure

A method of producing a structure containing a phase-separated structure, including a step in which a layer including an Si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the Si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.

Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern

A polymerization method of a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), which has excellent lithography properties, and is useful as a resist composition, the method including conducting polymerization using a mixed solvent containing 10 mass % or more of one or more of a cyclic ketone-based solvent, an ester-based solvent, and a lactone-based solvent. A resist composition containing the high-molecular weight compound (A1) and a method for forming a resist pattern using the same. 

Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern

A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the Pblock and Pblock being mutually bonded in the block copolymer, and the Pblock including a structural unit other than a structural unit constituting the Pblock; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the Pblock, a surface free energy of the Pblock and a surface free energy of the neutralization film are represented by a coordinate point A of the Pblock, a coordinate point B of the Pblock and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.

A method of forming a structure containing a phase-separated structure, the method including: a step of forming a layer containing a block copolymer having a plurality of blocks bonded and a purity of 98% or more, and a step of phase-separating the layer containing the block copolymer.

Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern

A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component which exhibits changed solubility in a developing solution by the action of an acid; and the base material component containing a resin component having a constituent unit derived from a compound represented by the following general formula (a0-1), at least two or more kinds of a constituent unit containing an acid dissociable group represented by the following general formula (a1-r-1) or (a1-r-2), and a constituent unit containing a lactone-containing, an &#x2014;SO-containing, or a carbonate-containing cyclic group; and a method for forming a resist pattern using the resist composition. 

Resist composition and method for forming resist pattern

A compound represented by formula (I). In the formula, Rrepresents a hydrocarbon group of 1 to 10 carbon atoms; Z represents a hydrocarbon group of 1 to 10 carbon atoms or a cyano group; provided that Rand Z may be mutually bonded to form a ring; X represents a divalent linking group having any one selected from &#x2014;O&#x2014;C(&#x2550;O)&#x2014;, &#x2014;NH&#x2014;C(&#x2550;O)&#x2014; and &#x2014;NH&#x2014;C(&#x2550;NH)&#x2014; on a terminal that comes into contact with Q; p represents an integer of 1 to 3; Q represents a hydrocarbon group having a valency of (p+1), provided that, when p is 1, Q may be a single bond; Rrepresents a single bond, an alkylene group which may have a substituent or an arylene group which may have a substituent; q represents 0 or 1; r represents an integer of 0 to 8; and Arepresents a metal cation or an organic cation. 

Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern

A method of producing a substrate provided with a metal nanostructure on the surface thereof, including: forming a layer containing a block copolymer having a plurality of polymers bonded on a surface of a substrate, and subjecting the layer to phase separation, selectively removing a phase of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer to expose part of the surface of the substrate, and allowing a metal ion to come into contact with the exposed surface of the substrate to effect an electrochemical reaction between the surface of the substrate and the metal ion, thereby depositing a metal on the surface of the substrate; and a substrate provided with a metal nanostructure on the surface thereof produced by the same method.

Substrate provided with metal nanostructure on surface thereof and method of producing the same

Growing community of inventors

Kawasaki, Japan

Takahiro Dazai