Nkk Corporation

Jfe Steel Corporation

Takahiko Oshige

Hiroaki Ono

Akira Kazama

Tsutomu Kawamura

Shoji Yoshikawa

Takeo Yamada

Kozo Harada

Mitsuaki Uesugi

Masaichi Inomata

Masahiro Iwabuchi

Shinichi Tomonaga

Shuji Kaneto

Hiroyuki Sugiura

Tsuneo Suyama

Yasuo Kushida

Shuichi Harada

Hajime Tanaka

Osamu Uehara

Shigemi Fukuda

Kazumichi Sashi

Yoshihito Sakamoto

Takeshi Yamazaki

Shin Ishikawa

Takahiro Kubota

Naoki Nishiyama

Takahiro Koshihara

Yoshiro Yamada

Yuji Matoba

Takamitsu Takayama

Yoshiyuki Umegaki

Shuichiro Nomura

Masami Tate

A surface defect inspection method includes: acquiring an original image by capturing an image of a subject of an inspection; generating texture feature images by applying a filtering process using spatial filters to the original image; generating a feature vector at each position of the original image, by extracting a value at a corresponding position from each of the texture feature images, for each of the positions of the original image; generating an abnormality level image representing an abnormality level for each position of the original image, by calculating, for each of the feature vectors, an abnormality level in a multi-dimensional distribution formed by the feature vectors; and detecting a part having the abnormality level that is higher than a predetermined level in the abnormality level image as a defect portion or a defect candidate portion.

Surface defect inspection method and surface defect inspection apparatus

A solar reflector plate maintains an excellent reflectance of a reflective layer and has excellent sand resistance and weather resistance. The solar reflector plate includes a substrate; a reflective layer provided onto the substrate; and a protective layer provided onto the reflective layer, wherein the protective layer contains silicon in an amount of 10% by mass to 60% by mass in terms of SiOand an organic substance, and has 1.5 to 3.2 oxygen atoms on average that form a chemical bond with silicon.

Solar reflector plate

A solar light reflecting plate used for a light condensing and heat collecting device which includes a solar light reflecting plate that reflects and condenses solar light and a heat collecting tube that receives the solar light condensed by the solar light reflecting plate and is heated by the condensed solar light, wherein the solar light reflecting plate includes at least a rolled substrate, a surface roughness of a solar light reflecting surface that is an outermost surface and that reflects solar light is 0.02 &#x3bc;m to 1.0 &#x3bc;m in terms of arithmetic mean roughness Ra, and the solar light reflecting plate is disposed so that an angle between a rolling direction of the substrate and a longitudinal direction of the heat collecting tube is 80&#xb0; to 100&#xb0;.

Solar light reflecting plate and light collecting/heat collecting device

A defect marking device includes a flaw inspection device which has a plurality of light-receiving parts that identify reflected lights coming from an inspection plane of a metal strip under two or more of optical conditions different from each other; a signal processing section that judges the presence/absence of surface flaw on the inspection plane based on a combination of reflected light components identified under these optical conditions different from each other; and a marking device which applies marking that indicates information relating to the flaw on the surface of the metal strip.

Method for marking defect and device therefor

The defect marking method comprises the steps of: installing a surface defect tester to detect surface flaw and a marker device to apply marking at defect position, in a continuous processing line of steel sheet; detecting the surface flaw on the steel sheet using the surface defect tester; determining defect name, defect grade, defect length, and defect position in the width direction of the steel sheet, on the basis of thus detected flaw information, further identifying the defect in terms of harmful defect, injudgicable defect, and harmless defect; applying tracking of the defect position for each of the harmful defect and the injudgicable defect; and applying marking to the defect position. The defect marking device comprises a defect inspection means having plurality of light-receiving parts and a signal processing section, and a marking means.

A method for detecting a surface flaw which includes the steps of (i) irradiating polarized light to a surface of a sample to be inspected and determining ellipso-parameters (.PSI., .DELTA.) of reflected light from the surface of the sample; (ii) irradiating light to a same position as irradiated by the polarized light and determining the intensity (I) of reflected light from the surface of the sample; and (iii) determining a type and grade of a flaw on the surface of the sample based on the ellipso-parameters (.PSI.,.DELTA.) and the reflected light intensity (I). A surface flaw detecting apparatus includes (i) a first measuring device for irradiating polarized light to a surface to be inspected and measuring ellipso-parameters (.PSI.,.DELTA.) of reflected light from the surface; (ii) a second measuring device for irradiating light to a same position as irradiated by the polarized light and measuring the intensity (I) of reflected light from that position; and (iii) an output device for outputting a three-dimensional coordinate position of .PSI., .DELTA., I representing the reflected light from the surface, while sorting the position into a preset zone.

Method and apparatus for detecting surface flaws

Ellipsometer and method of controlling coating thickness therewith

Movable optical parts included in an ellipsometer are omitted to increase the measurement speed and maintain constant, high measurement precision in film thickness measurement processing. A beam is radiated from a light source section onto a measurement target. A reflected beam having an elliptically polarized beam reflected by the measurement target is divided into four light components polarized in different directions. The optical intensities of the respective polarized light components are detected. Of the four detected optical intensities, one having the minimum value is omitted, and ellipsometric parameters .psi. and .DELTA. are calculated by using the remaining three optical intensities having the largest values. The ellipsometer comprises only stationary optical parts without using any movable optical parts. The polarization directions of the respective polarized light components, from which four optical intensities are obtained, are set at angles of 90.degree., 0.degree., +45.degree., and -45.degree. with respect to a reference direction. A composite beam splitter is used to extract the four polarized light components.

Measuring method for ellipsometric parameter and ellipsometer

Movable optical parts included in an ellipsometer are removed to increase the measurement speed, and a specific quadrant to which a phase difference .DELTA. as an ellipsometric parameter belongs is determined by one measuring operation. A beam is radiated from a light source section onto a measurement target, and the reflected beam having an elliptically polarized beam, which is reflected by the target, is divided into four different polarized light components. The optical intensities of the respective light components are then detected. Ellipsometric parameters .psi. and .DELTA. are calculated on the basis of the detected four optical intensities. In addition, the above-mentioned four different polarized light components are obtained by using a wave plate. Furthermore, the polarization directions of the four polarized light components whose optical intensities are obtained are respectively set at angles -45.degree., +45.degree., 90.degree., and 0.degree. with respect to a reference direction. Alternatively, a composite beam splitter is used to obtain four polarized light components.

Growing community of inventors

Tokyo, Japan

Takahiko Oshige