Dai Nippon Printing Co., Ltd.

Takaharu Nagai

Katsuya Hayano

Hiroshi Mohri

Koji Ichimura

Yasutaka Morikawa

Katsutoshi Suzuki

Saburou Harada

Kouji Yoshida

Hirokazu Oda

Yuichi Inazuki

Ryugo Hikichi

Naoko Nakata

Hideyoshi Takamizawa

Naoshi Kawamata

A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.

Production method of template, template blank, and template substrate for imprinting, production method of template for imprinting, and template

An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.

Imprint method and imprint mold manufacturing method

Provided are: an imprinting method which suppresses volatilization of a photocurable resin applied on a transfer-receiving substrate by an inkjet method, satisfactorily maintains the wet-spreading property of the resin at the time of transfer, maintains cleanness of the environment for transfer, and can fill the environment for transfer with a particular gas appropriate for transfer; and an imprinting apparatus. Disclosed is an imprinting method of using a template having a concavo-convex pattern formed thereon, and transferring the pattern of the template by imprinting to a photocurable resin on a transfer-receiving substrate, characterized in that, in a space where the template and the photocurable resin are brought into contact, clean air is sent to the space through an air blowing port during a standby mode of not performing imprinting, and the flow rate of clean air in the space is reduced or clean air is not sent during an imprinting mode.

Imprinting method and imprinting apparatus

The present invention provides a halftone mask comprising an assist pattern and a manufacturing method of the halftone mask, which uses an ArF excimer laser as an exposing source, is used for a projection exposure by an off axis illumination, does not resolve the as pattern while keeping the focal depth magnification effect as the assist pattern, and may form a transferred image having high contrast of a main pattern. A photomask is a photomask comprising the main pattern which is transferred to a transfer-target surface by the projection exposure and the assist pattern which is formed nearby the main pattern and not transferred, characterized in that the main pattern and the assist pattern are each constituted from a semi-transparent film made of the same material, a retardation of 180&#xb0; is generated between the light transmitting through the main pattern and the light transmitting through a transparent region of a transparent substrate, and a predetermined retardation within the scope of 70&#xb0; to 115&#xb0; is generated between the light transmitting through the assist pattern and the light transmitting through the transparent region of the transparent substrate.

Photomask and methods for manufacturing and correcting photomask

The present invention provides a halftone mask comprising an assist pattern and a manufacturing method of the halftone mask, which uses an ArF excimer laser as an exposing source, is used for a projection exposure by an off axis illumination, does not resolve the assist pattern while keeping the focal depth magnification effect as the assist pattern, and may form a transferred image having high contrast of a main pattern. A photomask is a photomask comprising the main pattern which is transferred to a transfer-target surface by the projection exposure and the assist pattern which is formed nearby the main pattern and not transferred, characterized in that the main pattern and the assist pattern are each constituted from a semi-transparent film made of the same material, a retardation of 180&#xb0; is generated between the light transmitting through the main pattern and the light transmitting through a transparent region of a transparent substrate, and a predetermined retardation within the scope of 70&#xb0; to 115&#xb0; is generated between the light transmitting through the assist pattern and the light transmitting through the transparent region of the transparent substrate.

An imprint mold has a base, an uneven structure area set on a surface of the base, a measurement area set in the uneven structure area, and a measurement mark structure positioned in the measurement area, the measurement mark structure having a plurality of pattern sets each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.

Growing community of inventors

Tokyo-to, Japan

Takaharu Nagai