Tokyo Electron Limited

Takafumi Hayama

Yuichiro Kunugimoto

Keishi Hamada

Toyohisa Tsuruda

Akira Fukutomi

Yasuaki Noda

Motoi Okada

Hidehiro Suzuki

Shoki Hamaguchi

A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate held by a substrate holder of the substrate processing apparatus; a monitoring data generation unit that generates monitoring video data based on imaging video data captured by the imaging unit during an execution of a substrate process performed by the substrate processing apparatus including a first process and a second process; and a monitoring condition changing unit that changes a generation condition of the monitoring video data during the execution of the substrate process so that at least a resolution or a number of frames of the monitoring video data during an execution of the second process is different from the monitoring video data during an execution of the first process.

Substrate processing monitoring apparatus based on imaging video data, substrate processing apparatus, substrate processing monitoring method, and storage medium

There is provided a liquid processing apparatus comprising: a stage on which a substrate is placed; a nozzle configured to supply a processing liquid to the substrate placed on the stage and perform a processing on the substrate; a capturing part configured to capture an image of the nozzle so as to acquire image data; and a detector configured to detect a liquid level based on a plurality of the image data acquired by the capturing part at different timings within a period in which a supply of the processing liquid from the nozzle is not performed, wherein the liquid level is formed by the processing liquid or a liquid other than the processing liquid in a processing liquid flow path provided inside the nozzle.

Liquid processing apparatus and method of detecting liquid in liquid processing apparatus

A method for evaluating a process recipe used in a liquid processing apparatus that performs a liquid processing by supplying a processing liquid from a nozzle to a substrate while rotating a holding part horizontally holding the substrate about a vertical axis, includes: storing the process recipe in a first storage part, which includes time-series data of a first combination of parameter values including a position of the nozzle and a rotation speed of the substrate; reading the process recipe from the first storage part; reading a pre-prepared risk data from a second storage part, which is determined by associating a second combination of parameter values with a risk information corresponding to a liquid splash risk; and displaying an assisting data for the first combination of parameter values in the process recipe, based on the process recipe and the pre-prepared risk data read from the first and second storage parts.

Process recipe evaluation method, storage medium, assisting device for process recipe evaluation, and liquid processing apparatus

A wet-processing apparatus, which spouts a coating liquid onto a surface of a substrate, includes: nozzles provided with passages for the coating liquid; a light source which illuminates an area between a plane containing the tips of the nozzles and the surface of the substrate; a camera for forming an image of the area; a control unit which provides a spout signal requesting spouting the liquid from the nozzle toward the substrate, and an imaging signal requesting the camera to start an imaging operation; and a decision unit which decides whether or not the liquid was spouted from the nozzle and whether or not changes occurred in the condition of the liquid spouted from the nozzle toward the substrate on the basis of an image formed by the camera and expressing the brightness of the liquid spouted toward the substrate and illuminated by light emitted by the light source.

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Koshi, Japan

Takafumi Hayama