Sinfonia Technology Co., Ltd.

Takaaki Nakano

Mitsutoshi Ochiai

A load port provided adjacent to a wafer transport chamber for taking in and out a wafer W between the wafer transport chamber and a FOUP, includes a plate-shaped part that constitutes a part of a wall of the wafer transport chamber, and has an opening for opening the wafer transport chamber; a door part for opening and closing the opening; a mounting table that is configured to mount a wafer storage container so as to oppose a lid part for opening and closing an internal space to the door part, and to move to and from the plate-shaped part; and an elastic part that is provided on the mounting table side of the plate-shaped part along the peripheral edge of the opening, wherein the elastic part elastically contacts the periphery of the lid part in the wafer storage container by moving the mounting table toward the plate-shaped part.

Load port and EFEM

A purge apparatus for replacing a gas atmosphere in a purge object vessel by a purge gas through a port provided on a bottom face of the purge object vessel is disclosed. The purge apparatus includes a purge unit attached to a table that receives the purge object vessel, and a purge nozzle body including a port contacting portion provided on an upper side of the purge nozzle body and an attachment object portion provided on a lower side of the purge nozzle body. The purge unit has an attachment portion and the port contacting portion of the purge nozzle body is configured to contact the port of the purge object vessel. The attachment object portion of the purge nozzle body removably engages with the attachment portion of the purge unit so that the purge nozzle body is removably attached to the purge unit.

Growing community of inventors

Tokyo, Japan

Takaaki Nakano