Mita Industrial Co., Ltd.

Takaaki Miyazaki

Tatsuo Aizawa

Akira Fushida

Hiroichi Morikawa

Toshihiro Shinsho

A process for preparing a photosensitive material for electrostatic photography having an improved memory resistance, which comprises a photoconductive layer on an electrically conductive substrate, the photoconductive layer comprising (1) a finely divided inorganic photoconductor, (2) 5 to 50 parts by weight, per 100 parts by weight of the photoconductor of an electrically insulating organic synthetic resin binder having a specific resistance of at least 10.sup.14 ohm-cm, and (3) 0.001 to 1 % by weight, based on the photoconductor, of at least one photo-memory erasing compound selected from alkali metal dichromates, which process comprises forming the photoconductive layer by applying a coating composition to the electrically conductive substrate at a coating weight of 5 to 50 g/m.sup.2, the coating composition comprising the photo-memory erasing compound, the photoconductor, the resin binder, an aromatic solvent in which the resin binder is dissolved or dispersed, an a polar solvent for the photo-memory erasing compound, the polar solvent being soluble in the aromatic solvent and being selected such that the photo-memory erasing compound is soluble in said polar solvent.

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Daito, Japan

Takaaki Miyazaki