Canon Kabushiki Kaisha

Taisuke Isano

Yasushi Kaneda

Kosuke Asano

A method for manufacturing a three-dimensional structure includes forming a first structure having a relief pattern on a substrate, forming a sacrifice layer on the first structure such that the sacrifice layer can be filled in a concave part of the first structure and the sacrifice layer can cover a surface of a convex part of the first structure on a side opposite to the substrate, forming a second structure having a relief pattern on the sacrifice layer, and a fourth step of removing the sacrifice layer from between the first structure and the second structure, and thereby bringing the second structure into contact with the surface of the first structure.

Manufacturing method of three-dimensional structure

A polarizer of the present invention having a higher level of polarization performance for a light in the deep ultraviolet wavelength range includes: a substrate transparent to deep ultraviolet light; and a periodic structure including a plurality of structural elements at predetermined intervals on the substrate, the polarizer being configured so that the deep ultraviolet light incident thereon is split into a light component reflected by the periodic structure and a light component passing between the structural elements adjacent to each other, and the periodic structure being composed of chromium oxide or tungsten.

Polarizer

A waveplate including a dielectric substrate and a periodic structure formed on the dielectric substrate, said periodic structure having a period which is equal to or smaller than a wavelength of an incident light, wherein the periodic structure is constructed of a deposited film, and a refractive index of the deposited film gradually changes in a thicknesswise direction of the deposited film.

Waveplate utilizing form birefringence and waveplate manufacturing method

A dielectric substrate having a refractive index nis covered with an amorphous dielectric medium having a refractive index nlarger than the refractive index n, and a rectangular grating is formed in the amorphous dielectric medium through an etching process. When microcrystal is formed in the amorphous dielectric medium through a thermal treatment to increase the refractive index n, a magnitude &#x394;n of structure double refraction increases accordingly. Hence, a phase refraction &#x394;&#x3a6; of an irregular grating pattern in the rectangular grating becomes large without increasing a depth D of each trench of the rectangular grating, and thus it is possible to obtain an optical retardation plate having a fine periodic structure and having a desired plate retardation.

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Utsunomiya, Japan

Taisuke Isano