Tokyo Electron Limited

Taisei Seguchi

Hiroki Endo

Dai Kitagawa

Nozomu Nagashima

Suguru Sato

Koei Ito

There is a substrate processing apparatus comprising: a chamber including a sidewall having an opening; a substrate support disposed in the chamber; a support member disposed above the substrate support; an inner wall member having a ceiling portion disposed above the substrate support and below the support member; a contact member attached to one of the support member and the inner wall member and configured to detachably fix the inner wall member to the support member by applying a spring reaction force to the other of the support member and the inner wall member in a horizontal direction; and an actuator configured to move the inner wall member downward to release the fixing of the inner wall member to the support member.

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Miyagi, Japan

Taisei Seguchi