Toshiba Memory Corporation

Taichi Wakui

Masaru Koyanagi

Satoshi Inoue

Yuui Shimizu

Kensuke Yamamoto

Mikihiko Ito

Yasuhiro Hirashima

Yasuhiro Suematsu

Kei Shiraishi

Shouichi Ozaki

Fumiya Watanabe

Yumi Takada

A semiconductor memory device includes a differential waveform shaping circuit including first and waveform shaping circuits connected in parallel. The first waveform shaping circuit has a first inverting amplifier, and two inverters connected in series. The first inverting amplifier inverts and differentially amplifies an input signal having a rectangular waveform. Then, the output of the first inverting amplifier is passed through the two inverters. The second waveform shaping circuit has a first inverter, a second inverting amplifier, and a second inverter connected in series. The second inverting amplifier inverts and differentially amplifies the output signal from the first invertor, and the second inverter inverts the output signal from the second inverting amplifier. The differential waveform shaping circuit generates an output signal by averaging the output signal from the first waveform shaping circuit and the output signal from the second waveform shaping circuit.

Semiconductor memory device

According to one embodiment, an electrostatic discharge semiconductor device includes one or more wiring layers first disposed over a substrate, including: a wiring electrically connected at a first connecting point of a pad, a second wiring electrically connected at a second connecting point of a ground wiring, and a third wiring electrically connected at a third connecting point of the ground wiring; a first transistor formed in the substrate comprising a first diffusion region electrically connected to the first wiring, a second diffusion region electrically connected to the second wiring, and a gate electrically connected to the ground wiring; and a second transistor formed in the substrate comprising the first diffusion region electrically connected to the first wiring, a third diffusion region electrically connected to the third wiring, and a gate electrically connected to the ground wiring, wherein, a first resistance value of a first current pathway leading from the first connecting point to the second connecting point via the first transistor is different from a second resistance value of a second current pathway leading from the first connecting point to the third connecting point via the second transistor.

Semiconductor device

Growing community of inventors

Kawasaki Kanagawa, Japan

Taichi Wakui