Ulvac, Inc.

Tohoku University

Amada Company, Limited

Taichi Suzuki

Toshiyuki Nakamura

Kenta Doi

Yasuhiro Morikawa

Yoichi Haga

Tadao Matsunaga

Takayuki Aoki

Koh Fuwa

Ken Maehira

Yasutomo Ohashi

Katsuhiro Fujita

Kanehide Amano

Hideki Sasaki

Humitaka Ohashi

The present disclosure provides an etching method that includes a resist pattern-forming step of forming a resist layer on a target object, the resist layer being formed of a resin, the resist layer having a resist pattern; an etching step of etching the target object via the resist layer having the resist pattern; and a resist protective film-forming step of forming a resist protective film on the resist layer. The etching step is repetitively carried out multiple times. A processing gas, used in the resist protective film-forming step, includes a gas capable of forming SiOα; wherein a is any one of F, Cl, H, and CH; and each of x, y, z, k, is a selected non-zero value. After the etching steps are repetitively carried out multiple times, the resist protective film-forming step is performed.

Etching method

A plasma processing device includes an inductively coupled plasma antenna including an input end and an output end, a series circuit including an additional inductor and a variable capacitor connected in series, and a controller that varies a capacitance of the variable capacitor. The input terminal is connected via an antenna matching device to an antenna power supply. The output terminal is connected to the additional inductor. The additional inductor is connected via the variable capacitor to ground.

Plasma processing device

An etching method of the invention includes: a resist pattern-forming step of forming a resist layer on a target object, the resist layer being formed of a resin, the resist layer having a resist pattern; an etching step of etching the target object via the resist layer having the resist pattern; and a resist protective film-forming step of forming a resist protective film on the resist layer. The etching step is repetitively carried out multiple times. After the etching steps are repetitively carried out multiple times, the resist protective film-forming step is carried out.

A received beam amount acquisition sectionacquires a received beam amount per unit time of a beam receiverat certain sampling time intervals. A beam shielding detection sectiondetects presence or absence of beam shielding of a monitoring beam B by determining whether or not the acquired received beam amount per unit time of the beam receiver is lower than a determination threshold Th for detecting the presence of beam shielding of the monitoring beam B. A detection sensitivity of the beam shielding detection sectionis configured to be switched from a normal sensitivity mode to a high sensitivity mode when bending is initial processing based on a predetermined processing program, and an acquired height position of the beam receiveris lower than a predetermined second height position LP

Optical safety device, press brake, and workpiece detection method

A ultrasound probe according to this invention is provided with: a first dry film resist having a plurality of first apertures formed in an array shape, and respectively supporting the piezoelectric elements in close contact with a rim part of each of the first apertures in a state of partly exposing the function elements; a second dry film resist laminated on the first dry film resist, and also having second apertures respectively enclosing each of the function elements, the second dry film resist being of a thickness equivalent to that of each of the function elements; and a third dry film resist laminated on the second dry film resist, and also having third apertures, and respectively sandwiching each of the piezoelectric elements with the first dry film resist in a state of partly exposing the piezoelectric elements in close contact with a rim part of each of the third apertures.

Device, method of manufacturing the device, and method of manufacturing array type of ultrasound probe

Growing community of inventors

Kanagawa, Japan

Taichi Suzuki