Sony Corporation

Sony Semiconductor Solutions Corporation

Other

Sumitomo Chemical Company, Limited

Taichi Natori

Hiroki Endo

Kazuhiro Machiguchi

Yuuji Ueda

Toyomi Jinwaki

Atsushi Yamamoto

Yoshinori Toumiya

Tadayuki Dofuku

Hitomi Kamiya

Ina Hori

Yasushi Maruyama

Takeshi Yanagita

Shunsuke Maruyama

Yukihiro Sayama

Hirotsugu Takahashi

Masaya Shimoji

Yoshikazu Tanaka

Takayuki Shoya

Yasunori Koshino

Youichi Otsuka

Kazuaki Ogawa

Ryoji Suzuki

Masanori Iwasaki

Ken Ozawa

Nobuyuki Matsuzawa

Tadashi Ishibashi

Ritsuo Takizawa

Daisuke Hobara

Nozomi Kimura

Tatsuya Ichikawa

Tomomi Ito

Masanori Shinada

Syunji Horiuchi

The present technology relates to an imaging element, a method of manufacturing the imaging element, and an electronic apparatus that make it possible to suppress generation of a void in an infrared cutoff filter layer. The imaging element includes: a light receiving sensor that performs photoelectric conversion of incoming light; a cover glass that protects a top surface side serving as a light incidence surface of the light receiving sensor; a frame that is disposed in an outer peripheral portion between the light receiving sensor and the cover glass, and is formed with use of an inorganic material; and an infrared cutoff filter layer that is formed on an inner side on a same plane as the frame. The present technology is applicable to, for example, an imaging element having a CSP structure, and the like.

Wafer level lens

Imaging element, method of manufacturing imaging element, and electronic apparatus

Imaging devices and electronic apparatuses incorporating imaging devices or image pick-up elements are provided. An imaging device as disclosed can include a substrate, a first opto-electronic converter having a first area formed in the substrate, and a second opto-electronic converter having a second area formed in the substrate. The first area is larger than the second area. In addition, a light blocking wall can extend from a first surface of the substrate such that at least a portion of the light blocking wall is between the first opto-electronic converter and the second opto-electronic converter.

Image pick-up apparatus

A solid-state imaging device includes: an R pixel provided with an R filter for transmitting red-color light; a B pixel provided with a B filter for transmitting blue-color light; an Spixel which is provided with an Sfilter with a visible light transmittance independent of wavelengths in a visible light region and has a sensitivity higher than that of the R pixel; and an Spixel which is provided with an Sfilter with a visible light transmittance independent of wavelengths in the visible light region and lower than the visible light transmittance of the Sfilter and has a sensitivity lower than the sensitivity of the Spixel.

Solid-state imaging device and electronic apparatus

A solid-state imaging device includes: an R pixel provided with an R filter for transmitting red-color light; a B pixel provided with a B filter for transmitting blue-color light; an S1 pixel which is provided with an S1 filter with a visible light transmittance independent of wavelengths in a visible light region and has a sensitivity higher than that of the R pixel; and an S2 pixel which is provided with an S2 filter with a visible light transmittance independent of wavelengths in the visible light region and lower than the visible light transmittance of the S1 filter and has a sensitivity lower than the sensitivity of the S1 pixel.

There is provided a solid-state imaging device that includes: colored pixels each including a first photoelectric conversion element and a colored filler; white pixels each including a second photoelectric conversion element and a clear layer; and an interlayer insulating film provided between the first photoelectric conversion element and the colored filter, and between the second photoelectric conversion element and the clear layer. The colored filter is provided on light-entering side of the first photoelectric conversion element. The clear layer is provided on light-entering side of the second photoelectric conversion element. The clear layer has a higher refractive index than a refractive index of the colored filter, and includes an inorganic dielectric film made of a different material from a material of the interlayer insulating film.

To provide an image capturing element and an image capturing apparatus in which an image capturing optical system can be thinned without degrading image capturing properties. An image capturing element according to an embodiment of the present technology includes an on-chip lens, a low refractive index layer and an infrared absorption layer. The on-chip lens is composed of a high refractive index material. The low refractive index layer is formed flatly on the on-chip lens and is composed of a low refractive index material. The infrared absorption layer is laminated above the low refractive index layer and is composed of an infrared absorption material.

Image capturing element and image capturing apparatus for removing infrared components from light

Disclosed herein is a solid-state image pickup device including a solid-state image pickup element operable to produce an electric charge according to the amount of light received, a lens disposed on the upper side of a pixel of the solid-state image pickup element, a protective film which covers the upper side of the lens and a surface of which is flattened, and a surface film which is formed at the surface of the protective film and which is higher in hydrophilicity than the inside of the protective film.

Solid-state image pickup device, method of manufacturing solid-state image pickup device, and electronic apparatus

A display unit includes: a plurality of light-emitting devices; and a separation section disposed between any adjacent two of the plurality of light-emitting devices and including a photoexcited material. A light-emitting device includes: an excitation light source; a wavelength conversion layer converting excitation light emitted from the excitation light source into light of a wavelength different from a wavelength of the excitation light; and a wavelength selection film disposed on a surface farther from the excitation light source of the wavelength conversion layer.

Display unit and method of manufacturing the same, electronic apparatus, illumination unit, and light-emitting device and method of manufacturing the same

Disclosed herein is a method of manufacturing a solid state imaging device, including the steps of: forming a light receiving portion in a light receiving area of a semiconductor substrate; forming a pad portion in a pad area of the semiconductor substrate; forming a microlens material layer over the light receiving portion and the pad portion; providing the microlens material layer with a microlens corresponding to the light receiving portion; forming a low-reflection material layer on the microlens material layer; etching the microlens material layer and the low-reflection material layer over the pad portion to form an opening; and imparting hydrophilicity to a surface of the low-reflection material layer and an inside portion of the opening by a normal temperature oxygen radical treatment.

Method of manufacturing solid state imaging device, and solid state imaging device

A solid-state image capture device includes photoelectric conversion elements that perform photoelectric conversion on incident light to obtain signal charges, color filter portions provided at light incident sides of the corresponding photoelectric conversion elements, and an organic photoelectric conversion layer provided at light incident sides of the color filter portions. The organic photoelectric conversion layer contains a pigment that is absorptive of near infrared light.

Solid-state image capture device and image capture apparatus

Growing community of inventors

Kanagawa, Japan

Taichi Natori