Taiwan Semiconductor Manufacturing Comp. Ltd.

Tai-Liang Lyu

Shao-Yen Ku

Tzu-Yang Chung

Chia-Ming Tai

Chao-Hui Kuo

Embodiments of mechanisms for cleaning a wafer are provided. A method for cleaning a wafer includes cleaning a wafer by using a wafer scrubber and cleaning the wafer scrubber in a scrubber cleaning module. An agitated cleaning liquid is applied on the wafer scrubber to clean the wafer scrubber. The method also includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning liquid.

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Zhubei, Taiwan

Tai-Liang Lyu