Semes Co., Ltd.

Taesuk Jung

Jae Hwan Cho

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a process chamber configured to form a treatment space, a gas supply unit configured to supply a process gas into an interior of the process chamber, a plasma generating unit configured to generate plasma from the process gas introduced into the interior of the process chamber, and a substrate support unit provided in the treatment space and configured to support a substrate, the substrate support unit may include a first plate, and a second plate that is adjacent to the first plate, and a gap may be formed between the first plate and the second plate, and a supply pipe is configured to supply a gas into the space defined by the gap.

Growing community of inventors

Suwon-si, South Korea

Taesuk Jung