Samsung Electronics Co., Ltd.

Seoul National University

Korea University Research and Business Foundation

Taekyoon Park

Jongmin Lee

Yongseok Lee

Jongwoo Sun

Hyungjoo Lee

Yeonsoo Kim

Eunhee Jeang

Jeongil Mun

Kyeonghun Kim

Seeyub Yang

Kwanyoung Lee

Gobong Choi

An optimization calculation apparatus may comprise an algorithm module obtaining a plurality of first solutions (S1) from a plurality of input data, obtaining second solutions (S2) from the first solutions (S1), and repeating the process to derive an optimal solution (Sm). The optimization calculation apparatus may further comprise a similarity determination module connected to the algorithm module and computing a similarity of isolutions in order to obtain (i+1)solutions (1≤i≤m−1).

Optimization calculation apparatus and optimization calculation method

A method of forming a plasma processing apparatus comprises providing a chamber, the chamber including a wall defining an interior, and a viewport extending through the wall. An analysis apparatus connected to the viewport may be formed. The analysis apparatus includes an analyzer adjacent to the chamber, a probe connected to the analyzer and aligned with the viewport, and a first window aligned with the probe, the first window having a first surface, and a second surface at an opposite side relative to the first surface, the second surface being exposed to the interior of the chamber, and the second surface of the first window has a scattering surface.

Method of forming plasma processing apparatus, related apparatus, and method of forming semiconductor device using the same

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Seoul, South Korea

Taekyoon Park