Tokyo Ohka Kogyo Co., Ltd.

Taeko Ikegawa

Tsuyoshi Nakamura

Hidekatsu Kohara

Kousuke Doi

Atsushi Sawano

A novel copolymer includes a repeating unit (B) derived from an unsaturated carboxylic anhydride, a repeating unit (C) represented by Formula (II), and a repeating unit (D) represented by Formula (III).

Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio

A novel copolymer includes a repeating unit (A) represented by, for example, Formula (I) below, and a repeating unit (B) derived from an unsaturated carboxylic anhydride. The novel copolymer is suitable for the preparation of a photoresist composition that has satisfactory transparency, high sensitivity and definition and exhibits satisfactory DOF properties in the field of photolithography using a deep UV light source. By the use of the photoresist composition, a process forms a resist pattern with a high aspect ratio.

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Kanagawa, Japan

Taeko Ikegawa