Samsung Electronics Co., Ltd.

Sansumg Electronics Co., Ltd.

Taeje Cho

Chajea Jo

Un-Byoung Kang

Hyunsoo Chung

Yun Seok Choi

Yonghwan Kwon

Ji Hwang Kim

Jung-Hwan Kim

Tae Hong Min

Hyuekjae Lee

In-Young Lee

Seung-Kwan Ryu

Daeho Lee

Chang-Seong Jeon

Sangwook Park

Sang-Uk Han

Chungsun Lee

Sunkyoung Seo

Inyoung Lee

Kyu-ha Lee

Yunhyeok Im

Seungduk Baek

Junyeong Heo

Kyol Park

Sang Cheon Park

Young Kun Jee

Wonkeun Kim

Moon Gi Cho

Jung-Seok Ahn

Won Il Lee

Taeeun Kim

Hogeon Song

Seyoung Jeong

Joonsik Sohn

Byoung-Soo Kwak

Chiyoung Lee

JiSun Hong

Keum-hee Ma

Hye-young Jang

Seungwon Park

Woonseong Kwon

Go Eun Lee

Youngsu Kim

Seongmin Ryu

Youngbok Kim

Hyung-sun Jang

A stacked-chip package of the inventive concepts includes a first chip and a second chip stacked on the first chip. The first chip may include a first cell array region, a first core circuit region including a first core terminal, and a first peripheral circuit region including a plurality of first peripheral circuit terminals. The second chip may include a second cell array region on the first cell array region, a second core circuit region on the first core circuit region and including a second core terminal, and a through via on the first peripheral circuit region and connected to at least one first peripheral circuit terminal of the plurality of first peripheral circuit terminals.

Stacked-chip packages

Stacked-chip packages having through vias

A semiconductor package includes upper and lower semiconductor chip packages, and a redistribution wiring layer pattern interposed between the packages. The lower package includes a molding layer in which at least one chip is embedded, and has a top surface and an inclined sidewall surface along which the redistribution wiring layer pattern is formed. The upper and lower packages are electrically connected to through the redistribution wiring layer pattern. A first package may be formed by a wafer level packaging technique and may include a redistribution wiring layer as a substrate, a semiconductor chip disposed on the redistribution wiring layer, and a molding layer on which the lower package, redistribution wiring layer pattern and upper package are disposed.

Semiconductor package and method of fabricating the same

A semiconductor package is provided. The semiconductor package include a lower semiconductor package including a lower package substrate and a lower semiconductor chip mounted thereon, and an upper semiconductor package provided on the lower semiconductor package to include an upper package substrate and an upper semiconductor chip mounted thereon. The upper package substrate include an upper heat-dissipation pattern, the lower semiconductor chip include a first via connected to the upper heat-dissipation pattern through the lower semiconductor chip, and the first via may provide a pathway for dissipating heat generated in the lower semiconductor chip.

Semiconductor package and electronic device having heat dissipation pattern and/or heat conducting line

Provided are methods of fabricating a semiconductor device. According to the method, a first glue layer, a first release layer, a second glue layer, and a second release layer may be sequentially interposed between a carrier and a device wafer. All of the first glue layer, the first release layer, the second glue layer, and the second release layer may be formed of thermosetting resin.

Method of fabricating a semiconductor device

A semiconductor device includes a semiconductor chip having an active surface and a non-active surface opposite to the active surface, an upper insulating layer provided on the non-active surface of semiconductor chip, and a via and a connection pad penetrating the semiconductor chip and the upper insulating layer, respectively. The connection pad has a first surface exposed outside the upper insulating layer and a second surface opposite to the first surface and facing the semiconductor chip. The first surface of the connection pad is coplanar with an upper surface of the upper insulating layer.

Semiconductor device

Embodiments of the inventive concepts provide a semiconductor package and a method of fabricating the same. The method includes forming a groove to separate first semiconductor chips from each other. Forming the groove include performing a first sawing process on a bottom surface of a semiconductor substrate to cut the semiconductor substrate and a portion of a mold layer in a direction inclined with respect to the bottom surface, and performing a second sawing process to cut the mold layer in a direction substantially perpendicular to the bottom surface of the semiconductor substrate. A minimum width of the groove formed in the semiconductor substrate by the first sawing process may be greater than a width of the groove formed in the mold layer by the second sawing process.

An embodiment includes a semiconductor package comprising: a substrate; a first semiconductor chip mounted on the substrate; a second semiconductor chip mounted on a top surface of the first semiconductor chip; a connecting bump disposed between the first and second semiconductor chips to electrically connect the second semiconductor chip to the first semiconductor chip; and a first heat dissipation part disposed on the top surface of the first semiconductor chip between the first and second semiconductor chips and spaced apart from a bottom surface of the second semiconductor chip.

Semiconductor package having stacked chips and a heat dissipation part and method of fabricating the same

A method of fabricating a semiconductor device is provided. The method may include preparing a substrate having a first surface and a second surface, forming a via hole exposing at least a portion of the substrate from the first surface of the substrate, forming a first insulating film on an inner wall of the via hole, forming a conductive connection part filling an inside of the via hole including the first insulating film, polishing the second surface of the substrate until the conductive connection part is exposed, and selectively forming a second insulating film on the second surface of the substrate using an electrografting method to expose the conductive connection part.

Methods of fabricating semiconductor devices

A method of manufacturing a semiconductor package includes providing a semiconductor chip including a circuit pattern, a connection pad, a first test pad and a second test pad, each of the connection pad, the first test pad and the second test pad respectively electrically connected to the circuit pattern, evaluating electrical characteristics of the semiconductor chip by applying a first test voltage to the first test pad and a second test voltage to the second test pad, the second test voltage being higher than the first test voltage, and electrically disconnecting the second test pad from the circuit pattern.

Semiconductor package and manufacturing method thereof

The method of fabricating a semiconductor package including preparing a semiconductor wafer having a first side and a second side, the second side facing the first side, and the semiconductor wafer including a through via exposed through the first side, forming trenches at cutting areas between chip areas and at edge areas of the semiconductor wafer on the first side, stacking a semiconductor chip on the through via, forming an under fill resin layer to fill a gap between the semiconductor chip and the semiconductor wafer and to cover a side of the semiconductor chip, and forming a molding layer to cover at least a portion of the under fill resin layer and to fill at least a portion of the respective trenches may be provided.

Method of fabricating semiconductor package, semiconductor package formed thereby, and semiconductor device including the same

A semiconductor package may include a first semiconductor chip including a first surface facing a package substrate, a second surface opposite to the first surface, and at least one through-electrode penetrating the first semiconductor chip, a molding layer molding the first semiconductor chip and exposing the second surface of the first semiconductor chip, a second semiconductor chip stacked on the second surface of the first semiconductor chip, and a non-conductive film provided between the first and second semiconductor chips. The second semiconductor chip includes an overhang portion extending past an edge of the first semiconductor chip. For example, a size of the second semiconductor chip may be greater than that of the first semiconductor chip, so the second semiconductor chip has an overhang. The second semiconductor chip includes at least one interconnecting terminal electrically connected to the at least one through-electrode.

Semiconductor packages and methods for fabricating the same

A semiconductor device having through-electrodes and methods for fabricating the same are provided. The semiconductor device may include a first semiconductor chip including a first active surface on which a first top pad is provided; a second semiconductor chip including a second active surface on which a second top pad is provided and a second inactive surface on which a second bottom pad is provided, the second semiconductor chip being stacked on the first semiconductor chip with the second active surface facing the first active surface; and a conductive interconnection configured to electrically connect the chips. The conductive interconnection includes a first through-electrode that penetrates the second semiconductor chip and electrically connects the second bottom pad to the second top pad; and a second through-electrode that passes through the second top pad without contacting the second top pad, and electrically connects the second bottom pad to the first top pad.

Semiconductor devices having through-electrodes and methods for fabricating the same

A method of manufacturing a semiconductor device include preparing an initial substrate including an edge region and a central region in which circuit patterns are formed, forming a reforming region in the edge region of the initial substrate, grinding the initial substrate to form a substrate, and cutting the substrate to form a semiconductor chip including each of the circuit patterns. A crystal structure of the reforming region is different from that of the initial substrate.

Method of manufacturing semiconductor device substrate with crystal structure reformation regions

Growing community of inventors

Yongin-si, South Korea

Taeje Cho