Skhynix Inc.

Tae Un Youn

Jong Wook Kim

Hye Lyoung Lee

Kwang Min Lim

Nam Cheol Jeon

Ho Jung Kang

Provided herein is a method of measuring a refractive index of a semiconductor memory device and a method of classifying a product group of a semiconductor memory device using the same. The method of measuring a refractive index of a semiconductor memory device includes measuring a positive breakdown voltage and a negative breakdown voltage of each of memory cells coupled to a selected word line. The method also includes checking a refractive index of a charge storage layer of each of the memory cells based on the measured positive breakdown voltage and the measured negative breakdown voltage.

Method of measuring refractive index of semiconductor memory device and method of classifying product group using the same

The present technology relates to a memory device and a method of operating the memory device. The memory device includes a memory block including a plurality of memory cells corresponding to a plurality of word line groups, a source line driver configured to apply an erase voltage to a source line of the memory block during an erase operation, a voltage generation circuit configured to apply an operation voltage increasing from a first operation voltage to a second operation voltage to the plurality of word line groups during the erase operation, and a control logic configured to control the source line driver and the voltage generation circuit to perform a suspend operation of stopping the erase operation.

Memory device and method of operating the memory device

A memory device includes a memory cell array and a peripheral circuit. The memory cell array includes a plurality of memory blocks. The peripheral circuit performs a dummy operation on a dummy area among the plurality of memory blocks of the memory cell array.

Memory device and operating method of the memory device

A non-volatile memory device and a read method thereof are disclosed. The read method includes providing a memory block having memory cells connected to word lines and connected in serial to a bit line, sensing potential of the bit line by applying a first read voltage to a selected word line of the word lines and providing a first pass voltage to an unselected word line adjacent to the selected word line, sensing potential of the bit line by applying a second read voltage higher than the first read voltage to the selected word line and providing a second pass voltage lower than the first pass voltage to the unselected word line adjacent to the selected word line, and sensing potential of the bit line by applying a third read voltage higher than the second read voltage to the selected word line and providing a third pass voltage lower than the second pass voltage to the unselected word line adjacent to the selected word line.

Non-volatile memory device and memory system including the same

The present invention discloses a method of fabricating a semiconductor memory device including forming sequentially a gate insulating layer and a first conductive pattern on a semiconductor substrate; forming a protective layer on surfaces of the first conductive pattern and the gate insulating layer; performing an etching process to form a trench, the etching process being performed such that the protective layer remains on side walls of the first conductive pattern to form a protective pattern; forming an isolation layer in the trench; etching the isolation layer; removing the protective pattern above a surface of the isolation layer; and forming sequentially a dielectric layer and a second conductive layer on surfaces of the isolation layer, the protective pattern and the first conductive pattern.

Growing community of inventors

Cheongju-si, South Korea

Tae Un Youn