Semes Co., Ltd.

Tae Suk Yun

Do Gyeong Ha

Moon Soon Choi

Chae Young Lim

Bu Young Jung

Gu Yeol An

Hyeon Suk Park

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a liquid supply unit configured to supply a treating liquid onto the substrate supported on the support unit, and wherein the liquid supply unit comprises: a tank configured to have an accommodation space for storing the treating liquid therein; a circulation line configured to circulate the treating liquid stored in the accommodation space; a supplementary line configured to supply the treating liquid to the accommodation space, and at which a valve is installed; a heater installed at the circulation line, and for heating the treating liquid; and a controller is configured to control the valve and the heater.

Unit for supplying liquid, apparatus and method for treating substrate with the unit

An apparatus for processing a substrate includes a housing having a processing space in which the substrate is processed, a support unit that supports the substrate in the processing space, a nozzle that dispenses a chemical onto the substrate placed on the support unit, a chemical supply unit that supplies the chemical to the nozzle, and a controller that controls the chemical supply unit.

Chemical supply unit, substrate processing apparatus, and substrate processing method

Growing community of inventors

Cheonan-si, South Korea

Tae Suk Yun