Lg Chem, Ltd

Korea Research Institute of Chemical Technology

Tae Seob Lee

Ji Hye Kim

Min Young Lim

Wan Joong Kim

Tae Ho Park

Hyun Min Park

Keun S Nam

Sung-Ho Chun

Chan Yeup Chung

Minyoung Lim

Woo Han Kim

Jung Ha Park

Moon Hwan Kim

Yoon Bin Lim

Se Jeong Kim

Seung Joon Lim

Gieun Park

Jae Gu Lim

Moon H, Kim

The present disclosure relates to a poly(amide-imide) copolymer in which each of at least one of imide repeating units and at least one of amide repeating units is substituted with a functional group including Chemical Formula 1, wherein, Ris hydrogen or an alkyl group having 1 to 10 carbon atoms, and L is a single bond or an alkylene having 1 to 10 carbon atoms, and a composition and a polymer film comprising the same.

Poly(amide-imide) copolymer, composition and polymer film comprising thereof

The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin including a (meth)acrylate-based resin containing a (meth)acrylate-based repeating unit in which a heterocyclic compound is substituted via a divalent functional group containing an alkylene sulfide having 1 to 20 carbon atoms.

Photoresist composition

The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.

Positive-working photoresist composition, pattern produced therefrom, and method for producing pattern

A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.

Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same

The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.

Positive photoresist composition, photoresist pattern using the same, and manufacturing method of the photoresist pattern

The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1:  In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.

Multi function photoacid generator and chemically amplified photoresist composition for thick layer comprising the same

The present invention relates to a method for preparing a perovskite compound usable as a light absorber of a solar cell, and provides a method for preparing a light absorber of a solar cell in which the crystallinity of a perovskite compound is increased, resulting in an increase in the stability and efficiency of the solar cell.

Method for preparing light absorber of solar cell

The present invention relates to quinolone carboxylic acid derivatives having useful antibacterial activities of formula (I): ##STR1## wherein, R.sub.1, R.sub.2, and R.sub.3, which may be the same or different, are each hydrogen or a halogen atom, or a lower alkyl group optionally substituted with an amino or a hydroxy group;

Quinolone carboxylic acid derivatives and process for preparing the same

The present invention relates to novel quinolone carboxylic acid derivatives having useful antibacterial activities of formula (I): ##STR1## wherein, R.sub.1, R.sub.2, and R.sub.3, which may be the same or different, are each hydrogen or a halogen atom, or a lower alkyl group optionally substituted with an amino or a hydroxy group;

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Daejeon, South Korea

Tae Seob Lee