Semes Co., Ltd.

Tae Hoon Lee

Hyun Yoon

Do Yeon Kim

Young Jun Son

Ju Won Kim

Ki Sang Eum

Jin Sung Sun

Jong Gun Lee

Bo Hee Lee

Sung Gyu Lee

Provided is a robotic arm includes an arm body; and a plurality of pads connected to the arm body and in contact with a substrate, wherein the arm body includes a ceramic plate and an antistatic coating layer disposed on an external surface of the ceramic plate, wherein the pad includes a first conductive layer, and wherein a conductive portion connecting the pad to the antistatic coating layer on an external side of the pad is provided.

Robotic arm and apparatus for treating substrate including the same

Provided is a support unit including a support plate on which the substrate is placed, and a support protrusion provided on the support plate and separating the substrate from the support plate, wherein the support plate includes a first protrusion protruding from an upper surface of the support plate, wherein the first protrusion is provided in a support region provided by the support protrusion.

Support unit, bake apparatus and substrate treating apparatus including the same

A substrate processing apparatus includes: a nozzle unit configured to discharge a processing liquid to a substrate; a pipe connected to the nozzle unit and a processing liquid supply unit supplying the processing liquid; a charge amount control unit disposed at the pipe, including a filter unit charged with positive charges or negative charges, and including at least one of a control valve, controlling a flow rate of the processing liquid passing through an inside of the filter unit, and a power supply unit, applying a voltage to the filter unit, to control a charge amount of the processing liquid; and a control unit connected to the charge amount control unit.

Substrate processing apparatus and substrate processing method

Proposed are a home port and a substrate processing apparatus using the same. The home port is installed in the substrate processing apparatus to temporarily mount a nozzle for discharging a process liquid to a substrate, and includes a main body having a space therein, a nozzle holder provided at an upper portion of the main body and configured to mount the nozzle, an inclined surface formed below the nozzle holder in the space, a first supply pipe configured to discharge a rinse liquid to a tip of the nozzle, a second supply pipe configured to inject the rinse liquid into the main body, a conductive wire configured to electrically connect the inclined surface and the first supply pipe, and a first switch installed on the conductive wire.

Home port and substrate processing apparatus using same

Various example embodiments provide a transfer hand for transferring a substrate. The transfer hand for transferring the substrate comprises: a body; and a vacuum assembly installed in the body and providing decompression to the bottom surface of a substrate to support the substrate at the upper part of the body; wherein the vacuum assembly comprises: an vacuum pad with conductivity contacting the substrate; and a sealing member provided between the vacuum pad and the body, the sealing member electrically connected to the vacuum pad; wherein the sealing member is grounded.

Growing community of inventors

Osan-si, South Korea

Tae Hoon Lee