Semes Co., Ltd.

Tae Ho Kang

Young Jin Kim

Ye Jin Choi

Byung Sun Bang

Young Joon Han

Jun Gwon Lee

Jong Won Moon

Eun Hyeok Choi

Dae Hun Kim

Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.

Substrate processing apparatus and substrate processing method

A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.

Unit for recycling treating liquid of substrate and apparatus for treating substrate with the unit

Growing community of inventors

Suwon-si, South Korea

Tae Ho Kang