Korea Kumho Petrochemical Co., Ltd.

Tae Gon Kim

Jung-Hoon Oh

Hyun Sang Joo

Dong Chul Seo

Jung Hoon Oh

Jin Bong Shin

Joon Hee Han

Provided is a copolymer. The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.

Polymer, method for producing the same, and resist composition containing the same

A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, Y, X, R, R, n, nand Ahave the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

Photoacid generator, method for producing the same, and resist composition comprising the same

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Chungcheongnam-do, South Korea

Tae Gon Kim