Jaewon Industrial Co., Ltd

Tae Gi Choi

Sung Won Shim

Byung Ki Son

Hwan Choi

Youn Soo Shin

Hwa Yeong Choi

Yeong Su Choo

Jae Won Shim

Yung Lim

Min Young Kim

In a method for purifying highly pure isopropyl alcohol used in a semiconductor cleaning process, diacetone alcohol present in isopropyl alcohol is removed by an adsorption process, and diacetone alcohol, triisopropyl borate, and metal impurities are removed by a distillation process. The purified isopropyl alcohol may have a purity of has the moisture of 10 ppm or less, the triisopropyl boron compound of 50 ppt or less, and each metal of the metal impurities of 20 ppt or less.

Purification method of high purity isopropyl alcohol used in semiconductor cleaning process

In a method for preparing a cathode of a secondary battery, a method for preparing a purified N-methyl pyrrolidinone (NMP), and a method for purifying a waste NMP, an inhibitor is added to prevent NMP from being decomposed to produce formaldehyde during the process. 1. The inhibitor may be a phenol-based antioxidant and/or an amine-based light stabilizer.

Method for preparing a cathode of a secondary battery and a purified N-methyl pyrrolidone, and purifying a waste N-methyl pyrrolidone using an inhibitor

Growing community of inventors

Jeollanam-do, South Korea

Tae Gi Choi