Mitsubishi Rayon Company, Limited

Shimadzu Corporation

Tadayuki Fujiwara

Kenji Kushi

Hikaru Momose

Akifumi Ueda

Kazuhiko Jufuku

Takayuki Iseki

Yoshihiro Kamon

Atsushi Ootake

Yukiya Wakisaka

Takeshi Iwai

Masaru Takeshita

Ryotaro Hayashi

Hideaki Kuwano

Akira Yanagase

Atsushi Koizumi

Masayuki Tooyama

Hitoshi Iwasaki

Naoshi Murata

Ryuichi Ansai

Toru Tokimitsu

Yoko Kakuno

Hideyasu Ryoke

Chikuya Takada

Koji Nishida

Susumu Kondo

Youichi Nagai

The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Resist polymer and resist composition

A liquid crystal substrate managing apparatus comprises a data management section with a database for recording a defect information acquired from a liquid crystal testing device, and an image information and a repair information acquired from a liquid crystal repair device. The data management section performs the reidentification of a defect and/or the redetermination of a panel and/or a substrate based on the defect information, the image information and the repair information recorded in the database.

Apparatus and method for managing liquid crystal substrate

A (meth)acrylate represented by the following formula (1): 

(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern

A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): wherein Rrepresents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; Rrepresents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or Rand Rrepresent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, and a carboxy group esterified with an alcohol containing 1 to 6 carbon atoms.

5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process

A (meth)acrylate represented by the following formula (): wherein each of R, R, Rand Rrepresents a hydrogen atom, a methyl group or an ethyl group; either one of Xor Xrepresents a (meth)acryloyloxy group and the other represents a hydrogen atom; both Aand Arepresent hydrogen atoms, or Aand Aform &#x2014;O&#x2014;, &#x2014;CH&#x2014; or &#x2014;CHCH&#x2014;, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.

(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns

A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II):

Resins for resists and chemically amplifiable resist compositions

The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25&#xb0; C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.

Chemical amplification resist composition

A substrate testing apparatus for testing a substrate by irradiation of electron beam comprises a scan parameter calculating unit, a stage control unit for controlling the movement of a stage, and an electron beam control unit for controlling an irradiating position of electron beam. The scan parameter calculating unit calculates a stage speed and the irradiating position of electron beam on the basis of an array of measurement points in a unit area set for each substrate species of object to be tested. The scan parameters for the substrate species are automatically calculated, and the driving of the testing apparatus is controlled in accordance with the calculated parameters, whereby it is unnecessary to restart the software.

Apparatus and method for testing substrate

The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of &minus;10 to &plus;10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure. The copolymer according to the present invention exhibits superior adhesion properties to surfaces possessing a high polarity, such as metal surfaces and the like, in addition to excellent hydrophobic and thermal resistance properties, and also displays a favorable solubility in solvents used for paints, resists, and the like.

Copolymer, process for producing the same, and resist composition

A photocuring sheet wherein a photocuring resin composition (A) comprising an acrylic resin with a photopolymerizable functional group on the side chains (a-1) and a photopolymerization initiator (a-2), is laminated on a transparent base sheet (B), photocuring decorative sheets and photocuring insert molding sheets employing it, and molded articles and a process for their manufacture, in which the sheets are used.

Photocurable sheet, moldings thereof, and processes for producing the same

In an x-ray diffractometer having (i) first and second motors 10, 17 for respectively rotating a sample 4 and an x-ray detector 13 around a rotational axis 7 and (ii) .theta.-2.theta. interlock control means 22 for supplying drive signals to the motors 10, 17, such that a .theta.-2.theta. relationship is always maintained between the angles of the sample 4 and the x-ray detector 13 with respect to irradiated x-rays 2, there is disposed a rotational vibration control unit 23 for supplying, to the first motor for rotating the sample holding member 6, a drive signal for rotationally vibrating the sample, in addition to the drive signal for .theta.-2.theta. interlock. Eliminating an individual drive mechanism for rotationally vibrating the sample 4, this arrangement makes it possible that, with a simple and economical structure, diffracted x-rays are efficiently detected even for a sample having an uneven surface, thereby to obtain an accurate measurement result.

X-ray diffractometer

A polyester resin for a dye receptive layer of a recording medium for sublimation type heat-sensitive transfer recording process, and a recording medium using thereof, which has superior resistance to light exposure and dark fade out. A polyester resin for a dye receptive layer of a recording medium for sublimation type heat-sensitive transfer recording process, wherein said polyester resin is formed by using a diol component containing a diol compound shown in Formula (1) in a range of 5-80 molar % with respect to the total diol component, and a receiving medium using thereof. ##STR1## (In Formula (1), each of R.sub.1 and R.sub.2 represents an alkylene group having a number of carbon atoms within a range of 1-12.)

Polyester resin for a dye receptive layer of a recording medium for

A recording medium for sublimation type heat-sensitive transfer recording process, in which an image receiving layer comprising a resin composition containing a dyeable resin and at least one phosphite antioxidant shown in Formulas (1), (2), or (3) is formed on a substrate surface. This recording medium for sublimation type heat-sensitive recording methods has extremely superior light resistance, and the image recorded on this recording medium suffers little fade out or discoloration as a result of exposure to light, so that this recording medium is expected to contribute greatly to the spread of video printers and the like. ##STR1## (In Formula (1), R.sub.1 and R.sub.2 represent H or an alkyl group having a number of carbon atoms within a range of 1-20, R.sub.3 and R.sub.4 represent alkyl groups having a number of carbon atoms within a range of 1-20, X represents H or an atomic group having 1-10 carbon atoms as a main skeleton thereof, and n has a value of 1, 2, 3, or 4.) ##STR2## (In Formula (2), R.sub.5 and R.sub.6 represent H or an alkyl group having a number of carbon atoms within a range of 1-20, R.sub.7 represents an alkyl group having a number of carbon atoms within a range of 1-20, Y represents H or an atomic group having 1-10 carbon atoms as a main skeleton thereof, and n has a value of 1, 2, 3, or 4.) ##STR3## (In Formula (3), RS, R.sub.9, R.sub.10, and R.sub.11 represent H or an alkyl group having a number of carbon atoms within a range of 1-20, Z represents H or an atomic group having 1-10 carbon atoms as a main skeleton thereof, and n has a value of 1, 2, 3, or 4.)

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Tokyo, Japan

Tadayuki Fujiwara