Canon Kabushiki Kaisha

Tadayasu Nishikawa

Tetsuya Mori

Yuichi Osakabe

Tsutomu Hashimoto

The present invention provides an imprint method of performing a forming process which includes supplying an imprint material on a substrate and then forming a pattern of the imprint material on the substrate by using a mold, the method comprising: dispensing, on the substrate, an adhesion material to bring the substrate and the imprint material into tight contact with each other; performing a first annealing process of heating and cooling the substrate on which the adhesion material has been dispensed; conveying the substrate to which the first annealing process has been performed; performing a second annealing process of heating and cooling the substrate which has been conveyed in the conveying; and performing the forming process on the substrate to which the second annealing process has been performed.

Imprint method, imprint apparatus, imprint system, and method of manufacturing article

A positioning apparatus comprises a first measuring device measuring a position of the stage in a first measuring range, a second measuring device measuring a position of the stage in a second measuring range having an overlapping range overlapping the first measuring range, a third measuring device measuring a position of the stage in the overlapping range, and a controller controlling the first measuring device to take over the measurement value obtained by the second measuring device in the overlapping range in moving the stage from the second measuring range to the first measuring range, thereby switching from measurement by the second measuring device to measurement by the first measuring device. The controller performs correction processing based on the measurement by the third measuring device so as to reduce an error of the measurement value obtained by the first measuring device after the switching.

Positioning apparatus, exposure apparatus, and device manufacturing method

An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.

Growing community of inventors

Oyama, Japan

Tadayasu Nishikawa