Central Glass Company, Limited

Hitachi, Ltd.

Director-general of Agency of Industrial Science and Technology

Tadashi Narita

Tokio Hagiwara

Hiroshi Hamana

Kazuhiko Maeda

Akira Nagai

Akio Takahashi

Shin Nishimura

Junichi Katagiri

Yoshihiro Sugi

Yoshihiro Kubota

Takehiko Matsuzaki

Kazuhiko Takeuchi

Takaaki Hanaoka

Akio Mukoo

Tatsuya Eto

The invention relates to a fluorine-containing compound containing a substituent represented by the formula 1: 

Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions

There is disclosed a method for producing aromatic polyamides represented by the following formula (III), which comprises reacting an aromatic dihalogen compound represented by the following formula (I) with a diamine compound represented by the following formula (II) in the presence of cobalt/phosphine complex and a basic substance under carbon monoxide atmosphere:

Method for synthesizing aromatic polymers

According to the present invention, there is provided a resin composition which can provide an insulating resin having excellent heat resistance and flame retardance after curing and showing a low dielectric constant. A fluorine-containing photo-setting resin composition comprising a polymer containing fluorine or a fluorine-containing group represented by general formula [II]: ##STR1## wherein R.sup.1 and R.sup.2 are selected from the group consisting of H, F, CH.sub.3 and CF.sub.3 ; R.sup.3 and R.sup.4 are selected from the group consisting of CH.sub.2 and CF.sub.2 ; x and y show 0 to 4 and m shows 30 to 1000, and a photopolymerization initiator, which is a solid at ambient temperature, melts between 100.degree. and 150.degree. C., has a melt viscosity of not greater than 10.sup.6 poise and is photocurable.

Fluorine-containing curable resin composition and use thereof

A methanol-insoluble homopolymer of an .alpha.-trifluoromethylacrylate, which has either an alkyl group or a fluorine-containing alkyl group in the ester radical, is formed at good yields in an organic aprotic solvent by using an alkali metal alkoxide, e.g. lithium t-butoxide, as anionic polymerization catalyst.

Method for anionic homopolymerization of .alpha.-trifluoromethylacrylate

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Yokohama, Japan

Tadashi Narita