Ricoh Company, Ltd.

Tadashi Mimura

Kenichiroh Hashimoto

Satoru Tobita

Tomohiko Koda

Ryouta Matsufuji

Hideyuki Makita

A liquid ejection head includes nozzles, separate chambers, a common chamber, inlet portions, a filter unit, and ribs. Droplets of liquid are ejected from the nozzles. The separate chambers are communicated with the nozzles. The inlet portions are communicated with the corresponding separate chambers. Liquid is supplied from the common chamber to the separate chambers through the inlet portions. The filter unit is disposed between the inlet portions and the common chamber to filter liquid in an area across the separate chambers in a first direction in which the nozzles are arrayed. The ribs are disposed in the filter unit at intervals corresponding in size to at least two of the separate chambers in the first direction to partition the filter unit. The inlet portions are communicated in the first direction with each other in at least one portion of each of the inlet portions facing the filter unit.

Liquid ejection head, liquid-droplet ejection device, and image forming apparatus

A liquid drop discharge head includes a chipthat is formed by separation of a silicon wafer. The silicon waferhas a first direction and a second direction which are mutually intersected. The chipis separated from the silicon waferby etching the wafer along a separation lineparallel to the first direction of the wafer and by dicing the waferalong a separation lineparallel to the second direction of the wafer.

Liquid drop discharge head and manufacture method thereof, micro device, ink-jet head, ink cartridge, and ink-jet printing device

A liquid drop discharge head includes a chip () that is formed by separation of a silicon wafer (). The silicon wafer () has a first direction and a second direction which are mutually intersected. The chip () is separated from the silicon wafer () by etching the wafer along a separation line () parallel to the first direction of the wafer and by dicing the wafer () along a separation line () parallel to the second direction of the wafer.

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Hyogo, Japan

Tadashi Mimura