Canon Anelva Corporation

Nhk Spring Co., Ltd.

Tadashi Inokuchi

Masayoshi Ikeda

Yasumi Sago

Toshihiro Tachikawa

Kazuaki Kaneko

Takashi Kayamoto

Takuji Okada

This application discloses the structure of an ESC stage where a chucking electrode is sandwiched by a moderation layer and a covering layer. The moderation layer and the covering layer have the thermal expansion coefficients between the dielectric plate and the chucking electrode. This application also discloses the structure of an ESC stage where a chucking electrode is sandwiched by a moderation layer and a covering layer, which have internal stress directed oppositely to that of the chucking electrode. This application further discloses a substrate processing apparatus for carrying out a process onto a substrate as the substrate is maintained at a temperature higher than room temperature, comprising the electrostatic chucking stage for holding the substrate during the process.

Electrostatic chucking stage and substrate processing apparatus

Growing community of inventors

Yasu, Japan

Tadashi Inokuchi