Sony Chemical & Information Device Corporation

Sony Corporation

Sony Chemicals Corporation

Tadashi Akamatsu

Junichi Ishii

Zemin Shi

Masatoshi Hasegawa

Mamiko Nomura

Kaori Seki

Tsuneo Hanada

Hiroyuki Torisu

Michio Sato

A polarizing plate has a polarizer and a protective film formed on at least one surface of the polarizer. The protective film is formed by curing an energy ray-curable composition that contains at least one of a first energy ray-polymerizing compound having a bisphenol residue, a second energy ray-polymerizing compound having a neopentylglycol group, a third energy ray-polymerizing compound having a trimethylolpropane group, and a fourth energy ray-polymerizing compound having a pentaerythritol group. In the polarizing plate, though the protective film is thin, the polarizer is protected from the influence of external moisture, etc., and therefore its polarizability is kept good even in high-temperature high-humidity environments.

Polarizing plate

A polyimide compound has a low coefficient of linear thermal expansion comparable to the coefficient of linear thermal expansion of a conductor to be covered by the polyimide. The polyimide compound is less susceptible to contraction caused by dehydration process. The compound is obtained by the reaction of a highly linear acid dianhydride with a highly linear diamine and has a high imidization rate. Having a low coefficient of linear thermal expansion comparable to the conductor to be covered by the polyimide, the polyimide compound of the present invention is less susceptible to contraction that occurs during polyimide formation. The polyimide compound is suitable for making curl-free flexible wiring boards.

Polyimide compound and flexible wiring board

A simple technique for introducing a hybrid alignment or a homeotropic (vertical) alignment into liquid crystal films, which, by their nature, tend to have a horizontal alignment of liquid crystal molecules. The technique does not require special alignment films. A liquid crystal composition for forming a liquid crystal film contains a polymerizable liquid crystal compound and a hydrolysate of an alkoxysilane compound. The hydrolysate of the alkoxysilane compound contains a siloxane oligomer of which degree of polymerization is from 2 to 25. Furthermore, the alkoxysilane compound is a trialkoxysilane compound having a functional group. This liquid crystal film composition can be produced by hydrolyzing an alkoxysilane compound to obtain a hydrolysate and then uniformly mixing the hydrolysate with a polymerizable liquid crystal compound. Alternatively, it can be obtained by uniformly mixing the alkoxysilane compound with the polymerizable liquid crystal compound and subsequently hydrolyzing the alkoxysilane compound in the mixture. One mole of the alkoxysilane compound is preferably hydrolyzed with 0.1 d to 2.0 d mol of water, given that the number of alkoxyl groups in a molecule of the alkoxysilane compound is d. An optically anisotropic film can be obtained by applying the liquid crystal film composition to a base film, causing the liquid crystal molecules in the composition to alignment in a nematic alignment, and curing the composition. The alignment of the liquid crystal molecules in the film is preferably a nematic hybrid or nematic hemeotropic (vertical) alignment.

Composition for forming liquid crystal film, optically anisotropic film, and production method thereof

Polyimide precursors contained in resin compositions of the present invention have a polymer structure unit represented by formula (1) below:wherein chemical structure Aincludes an alicyclic compound but not an aromatic compound such as a benzene ring so that they provide excellent light transmission over a wide wavelength range. The polyimide precursors are imidized at 7.5% or more and 36% or less so that they are less soluble in developing solutions and therefore are not dissolved in the developing solutions at unexposed parts. Thus, the resin compositions of the present invention can be used to form a resin film having a precise pattern by exposure and development.

Resin compositions, processes for preparing the resin compositions and processes for forming resin films

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Kanuma, Japan

Tadashi Akamatsu