Fujitsu Corporation

A. Aoki & Associates

Tadao Nakakuki

Masato Nakashima

Takashi Yoshida

Katsumi Fujihara

Kikuo Mita

Masayuki Oyama

Takefumi Inagaki

Takashi Fujimura

Seigo Igaki

Shuetsu Oikawa

An apparatus for detecting an edge of a semitransparent plane substance provided with a light source array including a plurality of light sources and a photosensor array including a plurality of photosensors. A selection circuit selects a pair of one of the light sources and one of the photosensors, respectively, and a comparator circuit compares the outputs of each of the photosensors in each pair when no detected substance exists between the light source array and the photosensor array, and the corresponding outputs when a substance exists between the light source array and the photosensor array, so that the edge portion of the substance can be detected.

Apparatus for detecting edge of semitransparent plane substance

A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.

Pattern inspection system

Growing community of inventors

Tokyo, Japan

Tadao Nakakuki