Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Electric Corporation

Tadao Minagawa

Hajime Nakatani

Yoshifumi Matsushita

Atsushi Sugitatsu

Toshinori Yagi

Takeo Yoshioka

Masahiro Kobayashi

Toshihiro Suzuki

Shiro Yamauchi

Nobuyuki Zumoto

Haruhiko Nagai

Kenyu Haruta

Takahiro Ohno

Eiichi Nagao

Kyoichi Ohtsuka

Yoshihiko Yamamoto

Masao Izumo

Yasushi Minamitani

Mitsuhito Kamei

Taketoshi Takemura

Chieko Nishida

Keiko Ito

Hiroshi Maekawa

Ichiro Yamasaki

Makiko Kawada

Katsu Ujita

Ei Tsuchie

Takashi Eura

Shungo Tsuboi

Kazuyuki Murakami

Satoshi Higashinakagawa

Shigemitsu Okabe

In a gas insulated breaking device which accommodates open/close elements including a puffer cylinder which compresses an insulation gas and extinguishes an arc and a contact finger which has a slide contact portion which is brought into slide contact with a slide contact portion of the puffer cylinder in the inside of a vessel in which the insulation gas is sealed, a relatively soft plating film is formed on the slide contact portion of the puffer cylinder, and a relatively hard plating film is formed on the slide contact portion of the contact finger, and the silver plating film of each slide contact portion has an inner layer thereof formed of a soft film and an outer layer thereof which constitutes a surface portion formed of a hard film.

Gas insulated breaking device

A gas sensor which can be used for measuring a low concentration repeatedly, which has a quick response and which can be used for a long time with high stability is provided. The gas sensor comprises a solid electrolyte, a detecting electrode provided in contact with one of the surfaces of the solid electrolyte and exposed to a gas to be detected, a counter electrode, provided in contact with the other surface of the solid electrolyte, and lead wires to place an electric voltage across both electrodes or to take out electric signals, wherein an inactive substance which is hard to form a reaction product with the gas to be detected is used as a material to constitute both electrodes.

Gas sensor

An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.

Optical processing method and apparatus for carrying out the same

An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excimer laser beam to pass through and a reflecting layer for reflecting it. A high reflectivity mirror disposed in opposition to the reflecting layer reflects the excimer laser beam reflected from the reflecting layer toward the patterning mask. An imaging lens images a pattern of the excimer laser beam transmitted through the patterning mask onto a workpiece for irradiation thereof. A workpiece moving mechanism and a mask moving mechanism move the workpiece and the mask moving mechanism, respectively. A control unit controls the workpiece moving mechanism and the mask moving mechanism such that the patterning mask and the workpiece are displaced along a same axis synchronously with each other in a scan moving direction which coincides with a direction in which the excimer laser beam shifts positionally while being reflected between the patterning mask and the reflecting means, for thereby allowing the workpiece to be scanned with the excimer laser beam. The workpiece can be processed uniformly and stably in accordance with a pattern of the patterning mask with high accuracy and reliability.

Excimer laser beam irradiation apparatus for optically processing

At least the opposing surface portions of the main electrodes of an excimer laser device are covered with materials which are resistive to chemical etching than nickel. The etching resistive material may be a platinum based alloy containing rhodium, ruthenium, iridium, or osmium; a nickel based alloy containing gold, platinum, rhodium, ruthenium, iridium, or osmium; or rhodium, ruthenium, iridium, or osmium. Thus, an excimer laser device is realized by which the lives of the electrodes and the laser gas are prolonged.

Excimer laser device

A lightning arrester monitor which consists of an oxygen gas sensor provided in a lightning arrester having a zinc-oxide-type element made of zinc oxide, the main component thereof, and other oxides added thereto, the oxygen gas sensor measures the oxygen concentration of the element which increases as degradation thereof goes on. The monitor makes it possible to assess degradation of the zinc-oxide-type element with ease, without requiring any complicated electrical circuit for detecting leakage current.

Lightning arrester monitor

An element for detecting internal faults in an insulating gas charged electrical apparatus comprises a substrate disposed in the electrical apparatus charged with an insulating gas, a pair of electrodes disposed on the substrate, and a thin metal film covering the pair of electrodes and the exposed surface of the substrate. This film is capable of producing fluorides with low conductivity upon reacting with a decomposed gas produced by internal faults of the electrical apparatus. Since the thin metal film exhibits high response characteristics readily in reaction with even a trace amount of a decomposed gas, it is possible to promptly detect faults occurring in the electrical apparatus, such as a partial discharge or local heating. In addition, a device for detecting internal faults in an insulating gas charge electrical apparatus using the internal fault detection element utilizes an optical signal for transmitting signals. Accordingly, the device is free from electromagnetically induced interference and is capable of remote monitoring because of the low level of loss in signal transmission.

Element and device for detecting internal faults in an insulating gas

Growing community of inventors

Amagasaki, Japan

Tadao Minagawa