Hitachi, Ltd.

Hitachi Instrument Engineering Co., Ltd.

Tadao Konishi

Yukinobu Shibata

Haruo Yoda

Masahide Okumura

Masamichi Kawano

Yoshiharu Utsumi

Akira Hirakawa

Ikuo Takada

A charged particle beam exposure apparatus includes an irradiator for irradiating a sample with a charged particle beam, an analog controller for analog controlling the charged particle beam, a digital controller for digital controlling the analog controller, and a digital transmission path connecting the analog controller to the digital controller. The analog controller is disposed inside a room, and the digital controller is disposed outside the room.

Charged particle beam exposure apparatus

A column section is disposed within a thermostatic chamber within a clean room, a section for analog controlling each portion of the column section is disposed within the clean room and outside of the thermostatic chamber, and a section for digital controlling the analog control section is disposed outside of the clean room.

An electron beam lithographic method in which a sample is irradiated with an electron beam, wherein an extreme point of a contour of a pattern is calculated and a lithographic area is divided into a first region that is surrounded by straight lines drawn from the extreme point in parallel with the x-axis and the y-axis of the sample and by said pattern, and second regions in order to be lithographed.

Electron beam lithographic method

A sample is bidimensionally scanned with an electron beam to display an image of the sample based on a secondary-electron signal generated from the sample. Two marks corresponding to two points on the sample are displayed in superposition to the image and a distance between the two points on the sample is calculated based on coordinates of the marks and a tilting angle of the sample to the electron beam.

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Mito, Japan

Tadao Konishi