National Research Council of Canada

Ta-Ya Chu

Ye Tao

Zhiyi Zhang

Christophe Py

Gaozhi Xiao

Afshin Dadvand

Disclosed is a method of printing an ultranarrow line of a functional material. The method entails providing a substrate having an interlayer on the substrate and printing the ultranarrow line by depositing ink on the interlayer of the substrate, the ink comprising the functional material and a solvent mixture that partially dissolves the interlayer on the substrate to cause the ink to shrink and sink into the interlayer on the substrate thereby reducing a width of the line.

Method of printing ultranarrow line

A method is disclosed for aligning layers in fabricating a multilayer printable electronic device. The method entails providing a transparent substrate upon which a first metal layer is deposited, providing a transparent functional layer over the first metal layer, depositing metal nano particles over the functional layer to form a second metal layer, exposing the metal nano particles to intense pulsed light via an underside of the substrate to partially sinter exposed particles to the functional layer whereby the first metal layer acts as a photo mask, and washing away unexposed particles using a solvent to leave partially sintered metal nano particles on the substrate.

Self-aligning metal patterning based on photonic sintering of metal nanoparticles

Disclosed is a method of printing ultranarrow-gap lines of a functional material, such as an electrically conductive silver ink. The method entails providing a substrate having an interlayer coated on the substrate and printing the ultranarrow-gap lines by depositing ink on the interlayer of the substrate, the ink comprising the functional material and a solvent that swells the interlayer to cause the interlayer to bulge at edges of the ink to thereby define embankments that confine the ink.

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Ottawa, Canada

Ta-Ya Chu