Toyo Boseki Kabushiki Kaisha

Syuusei Matsuda

Yoshiharu Morihara

Yumi Tsumagari

Kyoko Inagaki

Youji Takatsu

Takeshi Ookawa

Takeshi Okawa

Yoji Takatsu

A gas-barrier multilayer film, wherein (A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film, the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin including an ethylene-vinyl alcohol-based copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.1% by mass to 20% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c).

Gas-barrier multilayer film

Provided is a gas-barrier multilayer film which decreases little in gas-barrier properties even through retortion and which suffers no delamination. The gas-barrier multilayer film is characterized by comprising a plastic film and, superposed directly or through other layer on at least one surface thereof in the following order, an inorganic thin film layer and a gas-barrier resin composition layer. The gas-barrier film is further characterized in that the gas-barrier resin composition layer has been formed from a gas-barrier resin composition comprising a gas-barrier resin constituted of an ethylene/vinyl alcohol copolymer, an inorganic lamellar compound, and an additive, that the content of the inorganic lamellar compound in the gas-barrier resin composition is 0.1-9.0 mass %, that the additive is a coupling agent and/or a crosslinking agent, and that the gas-barrier resin composition layer has a thickness of 0.05-0.5 &#x3bc;m.

Growing community of inventors

Osaka, Japan

Syuusei Matsuda