Toshiba Memory Corporation

Kioxia Corporation

Syunichi Ono

Tsutomu Miki

Kenichi Otsuka

A polishing apparatus includes a polisher that polishes a target object to be polished. A holder is rotatable while holding the target object to be polished. Multiple concentric elastic members around the center of a rotation shaft of the holder are provided on the holder and elastically press the target object to be polished against the polisher. Multiple sensors are provided in the elastic members and detect vibration from a polishing surface of the target object to be polished. The detected vibration allows the polishing apparatus to create an unevenness map of the polishing surface and correspondingly actuate the concentric elastic members to remove the unevenness, according to a control sequence set in advance, based on the detected vibration, in a polishing control program to control the concentric elastic members.

Polishing apparatus

A polishing apparatus includes an acoustic sensor, a sound collector, an analyzer, a feature quantity calculator, and an end point calculator. The acoustic sensor detects the polishing sound of an object. The sound collector collects a polishing sound detected by the acoustic sensor. The analyzer performs frequency analysis on the power spectrum of the polishing sound with a predetermined time resolution. The feature quantity calculator calculates an arithmetic value of the power spectra having a preset time difference of the power spectra as a polishing feature quantity by using the analysis data provided by the analysis performed by the analyzer. The end point calculator determines a polishing end point of the object based on the change in the feature quantity.

Polishing apparatus, polishing method, and polishing control apparatus

A control device of a semiconductor manufacturing apparatus includes a processor and a memory connected to the processor and storing instructions executable by the processor. The instructions collect a sound of processing a substrate by the semiconductor manufacturing apparatus. The instructions calculate a difference of a power spectrum of the processing sound between a first point of time and a second point of time. The instructions determine a change point of processing of the substrate based on the difference.

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Kuwana Mie, Japan

Syunichi Ono