Tokyo Electron Limited

Syoichi Sato

Shingo Hishiya

Teruyuki Hayashi

Misako Saito

Yoshikazu Furusawa

Kota Umezawa

A thermal treatment apparatusincludes a reaction tubefor containing waferscontaminated with organic substances having a heatercapable of heating the reaction tube; a first gas supply pipefor carrying oxygen gas into the reaction tube; and a second gas supply pipefor carrying hydrogen gas into the reaction tube. Oxygen gas and hydrogen gas are supplied through the first gas supply pipeand the second gas supply pipe, respectively, into the reaction tube, and the heaterheats the reaction tubeat a temperature capable of activating oxygen gas and hydrogen gas. A combustion reaction occurs in the reaction tubeand thereby the organic substances adhering to the wafersare oxidized, decomposed and removed.

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Machida, Japan

Syoichi Sato