Dai Nippon Printing Co., Ltd.

Syogo Narukawa

Yuji Machiya

Kiyoshi Yamazaki

Hideyuki Nara

Tatsuya Tomita

A photomask with a dummy pattern is inspected in a predetermined detection sensitivity by using photomask pattern data designating a photomask with a dummy pattern to detect defects in the photomask. Coordinates indicating the positions of the defects are also determined. The defects in a design pattern area and those in a dummy pattern area are discriminated by using defect-discriminating data. The defects in the design pattern area and those in the dummy pattern area are examined on the basis of respective inspection specifications.

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Shinjuku-ku, Japan

Syogo Narukawa