Laser Systems and Solutions of Europe

Sylvain Perrot

Fulvio Mazzamuto

Karim Mikaël Huet

Nabil Douri

Guillaume Vincent Thebault

Guillermo Abraham Gonzalez Trujillo

Martin Heintzmann

A method for uniformly irradiating a frame of a processed substrate, the processed substrate including a plurality of frames, two consecutive frames being separated by an intermediate zone, the method includes steps of: determining an initial position of the processed substrate using a detecting unit; comparing the detected initial position with a first predetermined position associated with a first frame of the processed substrate; irradiating the first frame of the processed substrate by an irradiation beam emitted by a source unit and scanned by a scanning unit based on the first predetermined position, the irradiation beam being adapted to cover uniformly the whole first frame. A system for uniformly irradiating a frame of a processed substrate is also described.

Method and system for uniformly irradiating a frame of a processed substrate

The present invention relates to a process for irradiating a processed surface () of a processed substrate () so as to obtain a predefined temperature profile, the processed surface () comprising a first area () and a second area (), said first area () having a first combination of optical properties and thermal properties, and said second area () having a second combination of optical properties and thermal properties, said first combination and second combination being different. A further object of the invention is a system () for irradiating a processed surface () of a processed substrate () so as to obtain a predefined temperature profile, the processed surface () comprising a first area () and a second area (), said first area () having a first combination of optical properties and thermal properties, and said second area () having a second combination of optical properties and thermal properties, said first combination and second combination being different.

System and method to minimize irradiation non uniformity

An apparatus for measuring surface temperature of a substrate being illuminated by a pulsed light beam configured to heat the substrate and by a beam of probing light, wherein the heated substrate emits a radiated beam of thermal radiation, wherein the apparatus includes an optical system configured to collect the radiated beam and a reflected beam of probing light propagating in substantially close directions, wherein the collected radiated beam and the collected reflected beam are separately routed to a respective detector via a respective routing element, the respective detectors being configured to measure the intensity of the collected radiated beam and collected reflected beam simultaneously and at the same wavelength, wherein the surface temperature is calculated based on the collected radiated beam and on the collected reflected beam.

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Gennevilliers, France

Sylvain Perrot