Alphabet Energy, Inc.

Kla Tencor Corporation

Kla-tencor Technologies Corporation

Sylvain Muckenhirn

Matthew L Scullin

Chii Guang Lee

Gabriel Matus

Mingqiang Yi

Dawn L Hilken

Lisheng Gao

Tao-Yi Fu

Xuguang Jiang

Steve R Lange

Ping Gu

Methods and systems for monitoring a non-defect related characteristic of a patterned wafer are provided. One computer-implemented method includes generating output responsive to light from a patterned wafer using an inspection system. The method also includes determining differences between a value of a non-defect related characteristic of the patterned wafer and a known value of the non-defect related characteristic based on differences between one or more attributes of the output and one or more attributes of other output of the inspection system for a different patterned wafer having the known value of the non-defect related characteristic.

Methods and systems for monitoring a non-defect related characteristic of a patterned wafer

An array of nanowires and method thereof. The array of nanowires includes a plurality of nanowires. The plurality of nanowires includes a plurality of first ends and a plurality of second ends respectively. For each of the plurality of nanowires, a corresponding first end selected from the plurality of first ends and a corresponding second end selected from the plurality of second ends are separated by a distance of at least 200 &#x3bc;m. All nanowires of the plurality of nanowires are substantially parallel to each other.

Arrays of long nanostructures in semiconductor materials and methods thereof

A matrix with at least one embedded array of nanowires and method thereof. The matrix includes nanowires and one or more fill materials located between the nanowires. Each of the nanowires including a first end and a second end. The nanowires are substantially parallel to each other and are fixed in position relative to each other by the one or more fill materials. Each of the one or more fill materials is associated with a thermal conductivity less than 50 Watts per meter per degree Kelvin. And, the matrix is associated with at least a sublimation temperature and a melting temperature, the sublimation temperature and the melting temperature each being above 350&#xb0; C.

Low thermal conductivity matrices with embedded nanostructures and methods thereof

A surface and edge inspection system and the method for inspecting a substrate are disclosed. An edge inspection tool performs edge inspection of one or more substrates while a surface inspection tool performs surface inspection of a different substrate. A recipe for the surface inspection may be modified based on the results of the edge inspection.

Front face and edge inspection

Growing community of inventors

Santa Barbara, CA, United States of America

Sylvain Muckenhirn