Cadence Design Systems, Inc.

S.e.a. Medical Systems, Inc.

Svetlana Litvintseva

Nickhil Jakatdar

Emmanuel Drege

Kevin Chan

Francis Raquel

Mark A Miller

Leonid Matsiev

James W Bennett

Matthew F Smith

Michael J Weickert

Kit Blanke

Described herein are devices, systems, and methods for determining the composition of liquids, including the identity of one or more drugs in the liquid, the concentration of the drug, and the type of diluent using immittance spectroscopy. These devices, systems and methods are particularly useful for describing the identity and, in some variations, concentration of one or more components of a medical liquid such as intravenous fluid. In particular, described herein are devices, systems and methods that may operate in low ionic strength diluents. Also described are methods of recognizing complex immittance spectrograph patterns to determine the composition of a liquid by pattern recognition.

Systems and methods for intravenous drug management using immittance spectroscopy

A method and apparatus for modeling and cross correlation of design predicted criticalities include a feedback loop where information from the manufacturing process is provided to cross correlation engine for optimization of semiconductor manufacturing. The information may include parametric information, functional information, and hot spots determination. The sharing of information allows for design intent to be reflected in manufacturing metrology space; thus, allowing for more intelligent metrology and reduces cycle time.

Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing

A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include information such as parametric information, functional information, and hot spots determination.

Method and system for mask optimization

A method and apparatus for process optimization is provided. Process optimization improves parametric and functional yield post mask manufacturing.

Method and system for process optimization

A method and apparatus for inspection optimization is provided. Inspection optimization improves the parametric and functional yield using optimized inspection lists for in-line semiconductor manufacturing metrology and inspection equipment.

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San Jose, CA, United States of America

Svetlana Litvintseva