Ushio Denki Kabushiki Kaisha

Koninklijke Philips Corporation N.v.

Lumileds LLC

Sven Probst

Mohamad Hussein El-Husseini

Takahiro Hiraoka

Michael Loeken

Anatoli Saveliev

Jakob Willi Neff

Juergen Klein

A device () for providing an amount of power to a gas discharge lamp () comprises a control circuit () for controlling a supply circuit () for supplying the power according to a power versus voltage graph (). A calculator () calculates a boundary voltage value as a function of a measured voltage value of a voltage signal that has been measured after a predefined time-interval from a cold start of the gas discharge lamp (). A more accurate boundary voltage value results in more stability and in less time required to reach a steady state. The calculator () may be arranged for calculating the boundary voltage value as a function of a minimum voltage value of the voltage signal and of a steady state voltage value of the voltage signal. A memory () may store voltage values of the voltage signal and a processor () may update these voltage values.

Device and method for providing power to gas discharge lamp

A method for triggering a resonant charging circuit for a device for generating short-wavelength radiation based on discharge plasma is described. Switching times of the resonant charging circuit are determined in a non-time-critical method segment by simulation and are stored to be repeatedly retrievable. Measurement values of the resonant charging circuit are determined in real time in a time-critical method segment. At least one second switching time (t) at which a discharging switch of the resonant charging circuit is triggered in order to supply at a firing time (t) a discharge voltage (U), and the firing time (t) are calculated. The device has a first input unit, a first simulation unit, a first regression unit, a first measurement value unit, a first evaluation unit and a control unit for triggering a discharging switch of the resonant charging circuit.

Method for controlling an EUV source

A method for controlling a discharge plasma-based radiation source for stabilizing a radiation dose emitted in a pulsed manner is disclosed. A calibration function is determined from a relationship between values of an input quantity and values of an operating parameter of the source by applying different values of the input quantity to the source. Reference value selected from the values of the operating parameter is brought about during a pulse of the source. The value of a test quantity is acquired at each pulse. Any quantity influencing the emitted radiation dose can be selected as test quantity. A statistical value is formed from a defined quantity of values of the test quantity. A deviation between the statistical value and the reference value is determined. A result of a comparison of the deviation with a predefined tolerance range determines whether the method is repeated.

Method of calibrating a DPP-generated EUV light source

The present invention relates to a method of operating an electrical discharge device () comprising at least one first electrode () and at least one second electrode () at a distance therefrom, which electrodes are electrically connected to a power supply () and, upon ignition of a first gas discharge () between the electrodes (), transmit an electrical current (I), as a result of which a plasma () is produced in a working gas (), which plasma emits radiation (), in particular extreme ultraviolet and/or soft X-ray radiation, which is passed via a solid angle () into a chamber () outside the electrodes (). In order to prevent erosion at the electrodes (), it is proposed that the formation of a secondary plasma () in the chamber () is suppressed by a device ().

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Aachen, Germany

Sven Probst