Wolff Walsrode Ag

Wipak Walsrode Gmbh Co. & Kg

Amcor Flexibles Kreuzlingen Ltd.

Sven Jacobsen

Rainer Brandt

Gregor Kaschel

Christian Kuckertz

Rudi Klein

Ralf M Hartmann

Klaus Landes

Guy Boiron

Juan-Miguel Torregrosa

Detlef Wolters

Eric Bonabeze

Dorit Nelke

Jaquie Richards

Film laminates as high barrier films and their use in vacuum insulation panels

Described is a method of treating or coating homogeneously at least a portion of the surface of a material selected from metallic materials having a thickness of less than 100 &mgr;m and/or polymeric materials. The method of the present invention comprises exposing at least a portion of the surface of the material to an atmospheric plasma generated by an indirect plasmatron. In the method of the present invention, the surface of the material may undergo at least one of an increase in surface tension, a surface grafting, a surface cleaning and a surface sterilization.

Method of surface treating or coating of materials

Described is a multilayer film laminate having at least three layers, and gas barrier properties. The multilayer film laminate comprises sequentially: (I) at least two first layers, each of the first layers (I) having, on one side only, a vapor deposited coating selected independently from the group consisting of aluminum, SiOx and a metal oxide of main group 2 or 3 of the periodic table of the elements; and (II) an exterior polyolefin heat sealing layer. Also described is a method of using the multilayer film laminate as a barrier film in vacuum insulation panels.

Multilayer film laminates

Described is a process for the homogeneous surface activation of a material in web form, by means of plasma-treatment. The material in web form is selected from metallic materials in web form having a thickness of less than 100 &mgr;m, polymeric materials in web form and combinations thereof. The process involves treating homogeneously at least a portion of the surface of the material in web form, which is moved over at least one pair of rolls, with an atmospheric plasma, optionally in the presence of a process gas and/or a process aerosol. The atmospheric plasma is generated by an indirect plasmatron.

Process for the surface activation of materials

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Fallingbostel, Germany

Sven Jacobsen